...
首页> 外文期刊>Materials Chemistry and Physics >Effect of annealing temperature on the properties of pulsed magnetron sputtered nanocrystalline Ag:SnO_2 films
【24h】

Effect of annealing temperature on the properties of pulsed magnetron sputtered nanocrystalline Ag:SnO_2 films

机译:退火温度对脉冲磁控溅射纳米晶Ag:SnO_2薄膜性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Ag doped SnO_2 (Ag:SnO_2) films were prepared on glass substrates by pulsed dc magnetron sputtering. The effect of thermal annealing treatments on the physical properties of the films was investigated. Several analytical techniques such as X-ray diffraction, electron probe microanalysis, scanning electron microscopy, atomic force microscopy, four-point probe and double beam spectrophotometer were used to examine the changes in structural, compositional, surface morphology, electrical and optical properties. XRD results showed that the films were grown with (110) preferential orientation with an average grain size in the range from 4.8 to 8.9 nm. The smoothness of the films increased with annealing temperature. The films annealed at 500℃ presented an electrical resistivity of 0.007 Ω cm. The as deposited films exhibited the highest optical transmittance of 95% with band gap of 3.23 eV.
机译:通过脉冲直流磁控溅射在玻璃基板上制备了掺Ag的SnO_2(Ag:SnO_2)薄膜。研究了热退火处理对薄膜物理性能的影响。 X射线衍射,电子探针显微分析,扫描电子显微镜,原子力显微镜,四点探针和双光束分光光度计等几种分析技术被用来检查结构,组成,表面形态,电学和光学性质的变化。 XRD结果表明,该膜以(110)优先取向生长,平均晶粒尺寸在4.8至8.9nm范围内。薄膜的光滑度随退火温度的增加而增加。在500℃退火的薄膜的电阻率为0.007Ωcm。所沉积的膜表现出最高的光学透射率95%,带隙为3.23 eV。

著录项

  • 来源
    《Materials Chemistry and Physics》 |2012年第3期|1024-1028|共5页
  • 作者单位

    SEC-CEMUC, Department of Mechanical Engineering, University of Coimbra, 3030-788 Coimbra, Portugal,Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, South Korea;

    SEC-CEMUC, Department of Mechanical Engineering, University of Coimbra, 3030-788 Coimbra, Portugal;

    Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, South Korea;

    Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, South Korea;

    SEC-CEMUC, Department of Mechanical Engineering, University of Coimbra, 3030-788 Coimbra, Portugal;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; nanostructures; sputtering; crystal structure; electrical properties;

    机译:薄膜;纳米结构溅射晶体结构电性能;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号