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首页> 外文期刊>Materials Chemistry and Physics >Effect Of Ph And Current Density In Electrodeposited Co-ni-p Alloy Thin Films
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Effect Of Ph And Current Density In Electrodeposited Co-ni-p Alloy Thin Films

机译：pH和电流密度对电沉积Co-Ni-P合金薄膜的影响

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Co-Ni-P alloy thin films have been electrodeposited from sulfate baths at various solution pH and current density values. The effect of pH and current density on compositional, structural, morphological, and magnetic properties of these films was investigated by EDAX (energy dispersive analysis of X-ray spectroscopy), XRD (X-ray diffractometer system), AFM (atomic force microscope) and VSM (vibrating sample magnetometer). The reaction mechanism of individual deposition of Co, Ni and Co-Ni-P were investigated by cyclic voltammetry. The EDAX results revealed that cobalt and phosphorous content were high and nickel content was low at high solution pH and at low current density. X-ray diffraction studies exhibit that the intensity of hcp and Co-Ni-P amorphous phases increases and the intensity of fcc phase decreased when increasing the solution pH and decreasing the value of current density. The surface morphology of the films were observed by AFM. The deposited films exhibit hard magnetic properties at high pH value and soft magnetic properties at low pH value.
机译：Co-Ni-P合金薄膜已在各种溶液pH和电流密度值下从硫酸盐浴中电沉积。通过EDAX（X射线能谱分析），XRD（X射线衍射仪系统），AFM（原子力显微镜）研究了pH和电流密度对这些膜的组成，结构，形态和磁性的影响。和VSM（振动样品磁力计）。通过循环伏安法研究了Co，Ni和Co-Ni-P单个沉积的反应机理。 EDAX结果表明，在高溶液pH和低电流密度下，钴和磷含量高而镍含量低。 X射线衍射研究表明，当增加溶液pH值和减小电流密度值时，hcp和Co-Ni-P非晶相的强度增加，而fcc相的强度减小。通过AFM观察膜的表面形态。沉积的膜在高pH值下显示出硬磁性能，而在低pH值下显示出软磁性能。

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