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首页> 外文期刊>Materials Letters >Effect of calcination on the structural and optical properties of M/TiO_2 thin films by RF magnetron co-sputtering
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Effect of calcination on the structural and optical properties of M/TiO_2 thin films by RF magnetron co-sputtering

机译：射频磁控共溅射煅烧对M / TiO_2薄膜结构和光学性能的影响

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摘要

M/TiO_2 (M = metal; Ag, Cu) thin films on quartz glass were prepared by RF magnetron co-sputtering process and the calcination effects on their optical and structural properties were investigated. The as-deposited M/TiO_2 films are amorphous, and they are the anatase phase at 300-700 deg C. The Ag-doped films have the anatase phase at 900 deg C, whereas the Cu-doped films contain the rutile phase at 900 deg C, implying that metal doping affects the temperature of phase transformation from anatase to rutile. The crystallite size of the anatase phase and the agglomerates of primary particles of the metal-doped TiO_2 thin films increase with increasing calcination temperature. The X-ray photoelectron spectroscopy (XPS) results show that doped-silver is present in the metal state, while doped-copper exists in the mixed metal/oxide state. The as-deposited thin films have high transparency in the visible range. The transmittance of Cu/TiO_2 thin films calcined at 900 deg C is considerably reduced due to the crystal phase transformation, the variation of film composition and the optical scattering effect resulting from increased crystallite size. The absorption edge of transmittance is red-shifted at 900 deg C due to the change of the optical band gap energy.
机译：采用射频磁控共溅射法在石英玻璃上制备了M / TiO_2（M =金属； Ag，Cu）薄膜，并研究了煅烧对其光学和结构性能的影响。沉积后的M / TiO_2薄膜是非晶态的，它们在300-700℃时是锐钛矿相。掺杂Ag的薄膜在900℃时具有锐钛矿相，而掺杂Cu的薄膜在900℃时具有金红石相。 ℃，暗示金属掺杂影响从锐钛矿到金红石的相变温度。锐钛矿相的微晶尺寸和掺杂金属的TiO_2薄膜的一次颗粒的团聚体随着煅烧温度的升高而增加。 X射线光电子能谱（XPS）结果表明，掺杂的银以金属状态存在，而掺杂的铜以金属/氧化物混合状态存在。所沉积的薄膜在可见光范围内具有高透明度。由于结晶相变，膜组成的变化和微晶尺寸的增加而引起的光散射效应，在900℃煅烧的Cu / TiO_2薄膜的透射率大大降低。由于光学带隙能量的变化，透射率的吸收边缘在900摄氏度时发生红移。

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