Microstructures and mechanical properties of chromium oxide films by arc ion plating

A.L. Ji; W. Wang; G.H. Song

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Microstructures and mechanical properties of chromium oxide films by arc ion plating

机译：电弧离子镀氧化铬薄膜的组织与力学性能

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摘要

Chromium oxide (Cr_2O_3) films were deposited on stainless steel substrate by arc ion plating (AIP) technique. The results show that the flow rate of oxygen and bias voltage affected the microstructure, surface morphology and chemical composition of Cr_2O_3 films. The hardness of stoichiometric Cr_2O_3 film obtained at flow oxygen rate of 130 sccm and a bias voltage of -200 V reaches a maximum value of 36 GPa, much higher than that of films obtained by other deposition methods.

机译：通过电弧离子镀（AIP）技术将氧化铬（Cr_2O_3）膜沉积在不锈钢基板上。结果表明，氧气流量和偏压对Cr_2O_3薄膜的微观结构，表面形貌和化学成分都有影响。在流动氧气速率为130 sccm且偏压为-200 V时获得的化学计量Cr_2O_3薄膜的硬度达到最大值36 GPa，比通过其他沉积方法获得的薄膜要高得多。

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来源
《Materials Letters》 |2004年第14期|p.1993-1998|共6页
作者
A.L. Ji; W. Wang; G.H. Song;
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作者单位

Department of Surface Engineering of Materials, Institute of Metal Research, Academy of Sciences, 72 Wenhua Road, Shenyang 110016, PR China;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;
关键词
Cr_2O_3 films; Arc ion plating; Microstructure; Mechanical properties;

机译：Cr_2O_3薄膜;电弧离子镀;组织;力学性能;

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Microstructures and mechanical properties of chromium oxide films by arc ion plating

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