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Gum Metal thin films obtained by magnetron sputtering of a Ti-Nb-Zr-Ta target

机译：通过磁控溅射Ti-Nb-Zr-Ta靶获得的口香糖金属薄膜

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摘要

TNTZ quaternary superelastic coatings with a beta structure were successfully deposited by magnetron sputtering of a Ti-Nb-Zr-Ta target In this work, we discuss the effects of argon pressure and negative substrate bias voltage on the microstructure, morphology, texture, mechanical properties and super-elastic behavior of these coatings. The results show that the texture is random at high deposition pressure and it becomes {110} at the lowest deposition pressure (i.e. 0.2 Pa). Applying negative bias voltage causes the disappearance of {110} texture and promotes the appearance of {100} and {111} textures. The texture evolution is related to the ion bombardment of the growing film and to the surface mobility of adatoms. The highest hardness and Young's modulus are obtained for the Cum Metal (CM) film deposited at the lowest deposition pressure (i.e. 0.2 Pa) and a bias of - 200 V. The Evolution of the mechanical properties is discussed as a function of the film density, the compressive stress and grains' size changes. It was found that the film deposited at 0.2 Pa and floating potential presents the greatest depth recovery ratio. It is due to the fact that the film is dense and its texture is {110}. The negative bias voltage seems to have an unfavorable effect on the superelasticity.
机译：通过磁控溅射Ti-Nb-Zr-Ta靶成功沉积了具有β结构的TNTZ季超弹性涂层。在这项工作中，我们讨论了氩气压力和负衬底偏压对显微组织，形态，织构，机械性能的影响。这些涂料的超弹性行为。结果表明，在高沉积压力下，织构是随机的，在最低沉积压力（即0.2Pa）下，织构变为{110}。施加负偏压会导致{110}纹理消失，并促进{100}和{111}纹理的外观。质地的演变与生长膜的离子轰击以及吸附原子的表面迁移率有关。对于在最低沉积压力（即0.2 Pa）和-200 V偏压下沉积的Cum Metal（CM）膜，可以获得最高的硬度和杨氏模量。讨论了机械性能随膜密度的变化，压应力和晶粒尺寸会发生变化。发现以0.2Pa和浮置电位沉积的膜具有最大的深度恢复率。这是由于薄膜致密且质地为{110}。负偏压似乎对超弹性有不利影响。

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  • 来源
    《Materials Science and Engineering》 |2016年第15期|492-502|共11页
  • 作者

    S. Achache; S. Lamri; A. Alhussein; A. Billard; M. Francois; F. Sanchette;

  • 作者单位

    ICD-LASMIS, University de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pole Technologique de Haute-Champagne, 52800 Nogent, France,Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent-52, Pole Technologique de Haute-Champagne, 52800 Nogent, France;

    ICD-LASMIS, University de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pole Technologique de Haute-Champagne, 52800 Nogent, France,Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent-52, Pole Technologique de Haute-Champagne, 52800 Nogent, France;

    ICD-LASMIS, University de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pole Technologique de Haute-Champagne, 52800 Nogent, France,Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent-52, Pole Technologique de Haute-Champagne, 52800 Nogent, France;

    Univ. Bourgogne Franche-Comte, UTBM, IRTES-LERMPS EA7274, F-90100 Belfort, France,LRC CEA/UTBM LIS-HP, Site de Montbeliard, 90010 Belfort Cedex, France;

    ICD-LASMIS, University de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pole Technologique de Haute-Champagne, 52800 Nogent, France;

    ICD-LASMIS, University de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pole Technologique de Haute-Champagne, 52800 Nogent, France,Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent-52, Pole Technologique de Haute-Champagne, 52800 Nogent, France;

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  • 正文语种 eng
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  • 关键词

    Gum metal; Titanium-niobium-zirconium-tantalum thin films; Magnetron sputtering; Mechanical proprieties; Structure; Superelastic coatings;

    机译：口香糖金属;钛-铌-锆-钽薄膜;磁控溅射;机械特性;结构体;超弹性涂料;

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