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Mott transition in Ga-doped Mg_xZn_(1-x)O: A direct observation

机译:Ga掺杂的Mg_xZn_(1-x)O中的Mott跃迁:直接观察

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摘要

This paper reports the direct evidence for Mott transition in Ga-doped Mg_xZn_(1-x)O thin films. Highly transparent Ga-doped Mg_xZn_(1-x)O thin films were grown on c-plane sapphire substrates using pulsed laser deposition. 0.1 at.%, 0.5 at.% and 1 at.% Ga-doped Mg_(0.1) Zn_(0.9)O films were selected for resistivity measurements in the temperature range from 250 K to 40 mK. The 0.1 at.% Ga-doped Mg_(0.1) Zn_(0.9)O thin film showed typical insulator-like behavior and the 1 at.% Ga-doped Mg_(0.1) Zn_(0.9)O thin film showed typical metal-like behavior. The 0.5 at.% Ga-doped Mg_(0.1) Zn_(0.9)O film showed increasing resistivity with decreasing temperature; resistivity was saturated with a value of 1.15 × 10~(-2) Ω cm at 40mK, which is characteristic of the metal-insulator transition region. Temperature-dependent conductivity σ(T) in the low temperature range revealed that the electron-electron scattering is the dominant dephasing mechanism. The inelastic scattering time is found to vary as T~(-3/2).
机译:本文报道了掺杂Ga的Mg_xZn_(1-x)O薄膜中Mott跃迁的直接证据。使用脉冲激光沉积在c面蓝宝石衬底上生长高度透明的掺杂Ga的Mg_xZn_(1-x)O薄膜。选择0.1原子%,0.5原子%和1原子%的Ga掺杂的Mg_(0.1)Zn_(0.9)O薄膜在250 K至40 mK的温度范围内进行电阻率测量。 Ga掺杂0.1 at。%的Mg_(0.1)Zn_(0.9)O薄膜表现出典型的绝缘体行为,Ga掺杂1 at。%的Mg_(0.1)Zn_(0.9)O薄膜表现出典型的金属似行为。行为。 0.5at。%Ga掺杂的Mg_(0.1)Zn_(0.9)O薄膜显示电阻率随温度降低而增加;电阻率在40mK时达到1.15×10〜(-2)Ωcm的值,这是金属-绝缘体过渡区的特征。低温范围内随温度变化的电导率σ(T)表明,电子-电子散射是主要的移相机制。发现非弹性散射时间随T〜(-3/2)变化。

著录项

  • 来源
    《Materials Science and Engineering》 |2010年第3期|P.90-92|共3页
  • 作者单位

    Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States;

    rnDepartment of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States;

    rnDepartment of Biomedical Engineering, University of North Carolina and North Carolina State University, Campus Box 7115, Raleigh, NC 27695-7115, United States;

    rnDepartment of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States;

    rnDepartment of Biomedical Engineering, University of North Carolina and North Carolina State University, Campus Box 7115, Raleigh, NC 27695-7115, United States;

    rnDepartment of Chemistry, North Carolina State University, Raleigh, NC, United States;

    rnDepartment of Chemistry, North Carolina State University, Raleigh, NC, United States;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    mott transition; magnesium zinc oxide; gallium doping; thin film; pulsed laser deposition;

    机译:莫特过渡氧化镁锌;镓掺杂薄膜;脉冲激光沉积;

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