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首页> 外文期刊>Materials Science and Engineering. B, Solid-State Materials for Advanced Technology >Correlation between static characteristics and deep levels in InAlAs/InGaAs/InP HEMT'S
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Correlation between static characteristics and deep levels in InAlAs/InGaAs/InP HEMT'S

机译:InAlAs / InGaAs / InP HEMT中的静态特性与深能级之间的相关性

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摘要

It is well known that trapping effects can limit the output power performance of microwave field-effect transistors (FETs). This is particularly true for the wide band gap devices. In this paper, we present a detailed study of drain Current Deep Level Transient Spectroscopy CDLTS measurements performed on InAlAs/InGaAs/InP HEMT of two different samples. We demonstrate that a remarkable correlation exists between deep levels observed by CDLTS and the presence of parasitic effects such as kink and hysteresis effects.
机译:众所周知,陷阱效应会限制微波场效应晶体管(FET)的输出功率性能。对于宽带隙设备尤其如此。在本文中,我们对两个不同样品的InAlAs / InGaAs / InP HEMT上进行的漏极电流深电平瞬态光谱CDLTS测量进行了详细研究。我们证明了CDLTS观察到的深层次与诸如扭结和滞后效应等寄生效应的存在之间存在显着的相关性。

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