Low-temperature plasma processing for Si photovoltaics

著录项

• 来源
  《Materials Science & Engineering》 |2014年第4期|1-29|共29页
• 作者

  S.Q. Xiao; S. Xu; K. Ostrikov;

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• 作者单位

  Plasma Sources and Applications Centre (PSAC), NIE, and Institute of Advanced Studies, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616, Singapore,Key Laboratory of Advanced Process Control Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China;

  Plasma Sources and Applications Centre (PSAC), NIE, and Institute of Advanced Studies, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616, Singapore;

  Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, New South Wales 2070, Australia,Plasma Nanoscience, School of Physics, The University of Sydney, Sydney, New South Wales 2006, Australia;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  Low-temperature plasma; Si materials and solar cells; Plasma dissociation and dcposition; Hydrogen-surface interactions; Plasma cleaning; Plasma texturing; Surface passivation; Plasma induced p-n junction; Plasma diagnostics;

  机译：低温等离子体硅材料和太阳能电池;血浆解离和沉积;氢-表面相互作用;等离子清洗;等离子体织构;表面钝化;等离子体诱导的p-n结;血浆诊断;