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首页> 外文期刊>Microelectronic Engineering >Infrared detector based on crystal ion sliced LiNbO_3 single-crystal film with BCB bonding and thermal insulating layer
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Infrared detector based on crystal ion sliced LiNbO_3 single-crystal film with BCB bonding and thermal insulating layer

机译:基于晶体离子切割LINBO_3单晶膜的红外探测器用BCB键合和隔热层

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摘要

In this study, LiNbO3 (LNO) thin films prepared by crystal ion slicing (CIS) technology have been used to fabricate pyroelectric infrared detectors. Crack free LNO film with single crystal structure have been prepared on a LNO holder substrate by CIS technology using He+ implantation and benzocyclobutene (BCB) bonding process. The surface roughness caused by the Gauss distribution of He+ has been decreased from 10.81 nm to 4.66 nm after Ar+ treatment. The pyroelectric coefficient of LNO thin film is 5 x 10(-5)C/m(2).K measured by dynamic method, which is comparable to LNO bulk crystal materials. The Rv value of infrared device fabricated by LNO single crystal film was calculated to be 1.93 x 10(3) V/W at 5 Hz chopper frequency. Compared to normally used SiO2 bonding layer, the thermal isolation properties have been improved by BCB bonding material according to the thermal finite element analysis. The results demonstrated CIS technology using BCB bonding materials is a promising method to fabricate integrated pyroelectric devices.
机译:在该研究中,通过晶体离子切片(CIS)技术制备的LINBO3(LNO)薄膜已用于制造热电红外探测器。通过CIS技术使用HE +植入和苯并环丁烯(BCB)键合工艺,在LNO保持器基板上制备了具有单晶结构的裂缝免费的LNO膜。由AR +处理后,由He +的高斯分布引起的表面粗糙度从10.81nm到4.66nm降低。通过动态方法测量的LNO薄膜的热电系数是5×10( - 5)C / m(2).K,其与LNO散装晶体材料相当。由LNO单晶膜制造的红外装置的RV值以5 Hz斩波频率计算为1.93×10(3)v / w。与正常使用的SiO 2粘合层相比,通过根据热有限元分析通过BCB键合材料改善了热分离性能。结果证明了使用BCB粘合材料的CIS技术是制造集成热电装置的有希望的方法。

著录项

  • 来源
    《Microelectronic Engineering》 |2019年第5期|1-5|共5页
  • 作者单位

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China|Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China|Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China|Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci & Technol China Sch Elect Sci & Engn Chengdu 610054 Sichuan Peoples R China|Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Sichuan Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Crystal ion slicing; Pyroelectric infrared detector; Thermal simulation; LiNbO3;

    机译:晶体离子切片;热电红外探测器;热仿真;LINBO3;

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