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首页> 外文期刊>Microelectronic Engineering >Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging
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Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging

机译：通过电子束光刻和脉冲电压电镀为软X射线成像的30nm Au区板的纳米制剂

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摘要

High resolution Fresnel zone plates for nanoscale 3D imaging of materials by both soft and hard X-ray are growingly needed in broad applications in nanoscience and technology. When the outmost zone-width approaches 30 nm or even below, electro-deposition of gold into narrow trenches replicated by electron beam lithography in resist becomes increasingly difficult. Pulse electroplating instead of conventional direct-current one has been attempted in this work to overcome the problem in the au deposition in narrow trenches. Careful study of the au deposition rate as the function of adjustment parameters including the anodic bias, the pulse frequency and the deposition time has been systematically carried out. The optimized window of the parameters is adopted in the fabrication of 30 nm zone plates with the aspect ratio from 3:1 up to 7:1 and the duty cycle close to 0.5. Imaging of in-house made Siemens stars with 30 nm as the narrowest line-width has been successfully demonstrated in soft X-ray (706 eV). The origin of electroforming of well-structured au zones by pulse electroplating is discussed
机译：在纳米科技和技术的广泛应用中，越来越需要通过软和硬X射线的纳米级3D成像的高分辨率菲涅耳区平板。当最外面的区域宽度接近30nm或甚至下方时，金沉积到通过电子束光刻在抗蚀剂中复制的窄沟槽变得越来越困难。在这项工作中已经尝试了脉冲电镀而不是传统的直流电镀，以克服窄沟中Au沉积中的问题。仔细研究AU沉积速率作为调整参数的功能，包括阳极偏压，脉冲频率和沉积时间。在30nm区域板的制造中采用了参数的优化窗口，其纵横比为3：1至7：1，占空比接近0.5。在软X射线（706eV）中成功地证明了内部的内扇恒星的内部制作的西门子恒星，随着最窄线宽（706eV）。讨论了通过脉冲电镀粗结构化的Au区电铸的起源

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  • 来源
    《Microelectronic Engineering》 |2020年第3期|111254.1-111254.6|共6页
  • 作者

    Zhu Jingyuan; Chen Yifang; Xie Shanshan; Zhang Lijuan; Wang Chunpeng; Tai Renzhong;

  • 作者单位

    Fudan Univ Sch Informat Sci & Engn State Key Lab Asic & Syst Nanolithog & Applicat Res Grp Shanghai 200433 Peoples R China;

    Fudan Univ Sch Informat Sci & Engn State Key Lab Asic & Syst Nanolithog & Applicat Res Grp Shanghai 200433 Peoples R China;

    Fudan Univ Sch Informat Sci & Engn State Key Lab Asic & Syst Nanolithog & Applicat Res Grp Shanghai 200433 Peoples R China;

    Chinese Acad Sci Shanghai Inst Appl Phys Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;

    Chinese Acad Sci Shanghai Inst Appl Phys Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;

    Chinese Acad Sci Shanghai Inst Appl Phys Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Fresnel zone plates; Electron beam lithography; Electroplating; X-ray imaging; 30 nm resolution;

    机译：菲涅耳区板;电子束光刻;电镀;X射线成像;30nm分辨率;

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