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Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

机译：电子束和X射线光刻技术制作X射线成像波带片

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摘要

X-ray imaging and microscopy techniques have been developed in worldwide due to their capabilities of large penetration power and high spatial resolution. Fresnel zone plates is considered to be one of the most convenient optic devices for X-ray imaging and microscopy system. The zone plates with aspect ratio of 7 and 13 have been fabricated by e-beam lithography combined with X-ray lithography in this paper. Firstly, the X-ray lithography mask of zone plates with outermost zone width of 100 nm was fabricated by e-beam lithography and gold electroplating techniques. Secondly, the zone plates with gold profile thickness of 700 and 1,300 nm were replicated by X-ray lithography and gold electroplating techniques. X-ray imaging and microscopy techniques were introduced to characterize the high-aspect-ratio zone plates’ inner structures. At the X-ray energy of 7.5 keV, the first-order focusing efficiency of zone plates with gold profile thickness of 700 nm is about 8.63%.
机译：X射线成像和显微技术由于其强大的穿透能力和高空间分辨率而在世界范围内得到了发展。菲涅耳波带片被认为是X射线成像和显微镜系统最方便的光学器件之一。本文通过电子束光刻技术与X射线光刻技术相结合，制作了纵横比为7和13的波带片。首先，通过电子束光刻和金电镀技术制造了最外层宽度为100 nm的波带片的X射线光刻掩模。其次，通过X射线光刻和金电镀技术复制金轮廓厚度为700和1300nm的波带片。引入了X射线成像和显微镜技术来表征高纵横比波带片的内部结构。在7.5 keV的X射线能量下，金轮廓厚度为700 nm的波带片的一阶聚焦效率约为8.63％。

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