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首页> 外文期刊>Microelectronic Engineering >Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template
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Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template

机译：在干法刻蚀的机械稳定的无机模板中通过金属电镀纳米加工硬X射线光学器件

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摘要

A nanofabrication process for high resolution X-ray optics and X-ray lithography masks was developed. The process is based on the plasma etching of a sacrificial hard inorganic interlayer (Si, Si_3N_4, SiO_x or HSQ) used for pattern transfer and aspect ratio amplification. The structures are first defined on a top thin metal film by electron beam lithography and lift-off; a thin nickel layer at the bottom of the hard interlayer is used as etch stop. A base plating (Cr/Au) under the nickel serves as seed layer for the electroplating of an X-ray absorber or phase shifting material. The fabrication is completed by the stripping of the hard template by wet or dry etching. Compared to methods based on analogous process schemes, in which the aspect ratio of nanostructures is instead amplified by pattern transfer into a sacrificial polymer interlayer by oxygen plasma, the investigated method is advantageous for the higher mechanical stability of the nanostructured hard templates with respect to the polymer ones, thus enabling the realization of higher aspect ratio features.
机译：开发了用于高分辨率X射线光学器件和X射线光刻掩模的纳米加工工艺。该工艺基于对用于图案转移和纵横比放大的牺牲硬无机中间层（Si，Si_3N_4，SiO_x或HSQ）的等离子蚀刻。首先通过电子束光刻和剥离在顶部金属薄膜上定义结构；硬质中间层底部的镍薄层用作蚀刻停止层。镍下方的基底镀层（Cr / Au）用作X射线吸收剂或相移材料电镀的籽晶层。通过通过湿法或干法蚀刻剥离硬模板来完成制造。与基于类似工艺方案的方法相比（其中纳米结构的长宽比通过氧等离子体通过图案转移到牺牲性聚合物中间层中来放大），所研究的方法相对于纳米结构的硬模板具有更高的机械稳定性。聚合物材料，因此可以实现更高的长宽比特征。

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  • 来源
    《Microelectronic Engineering》 |2011年第8期|p.2552-2555|共4页
  • 作者

    Gianluca Grenci; Alessandro Pozzato; Alessandro Carpentiero; Enrico Sovernigo; Massimo Tormen;

  • 作者单位

    IOM-CNR, Laboratorio TASC. Area Science Park - Basovizza, SS 14 Km 1635, 34149 Trieste. Italy;

    IOM-CNR, Laboratorio TASC. Area Science Park - Basovizza, SS 14 Km 1635, 34149 Trieste. Italy ThunderNIL S.rl, Via Ugo Foscob 8.1-35131 Padova, Italy;

    IOM-CNR, Laboratorio TASC. Area Science Park - Basovizza, SS 14 Km 1635, 34149 Trieste. Italy;

    IOM-CNR, Laboratorio TASC. Area Science Park - Basovizza, SS 14 Km 1635, 34149 Trieste. Italy University of Trieste, Graduate School of Nanotechnology, P.le Europa 1, Italy;

    IOM-CNR, Laboratorio TASC. Area Science Park - Basovizza, SS 14 Km 1635, 34149 Trieste. Italy ThunderNIL S.rl, Via Ugo Foscob 8.1-35131 Padova, Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    x-ray optics; x-ray microscopy; x-ray lithography; hsq; ebl; dry etching;

    机译：X射线光学;X射线显微镜;X射线光刻;HSQ;EBL;干法刻蚀;

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