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首页> 外文期刊>Microelectronic Engineering >Reflow of supported sub-100 nm polymer films as a characterization process for Nanolmprint lithography
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Reflow of supported sub-100 nm polymer films as a characterization process for Nanolmprint lithography

机译：回流支持的100 nm以下的聚合物薄膜作为Nanolmprint光刻的表征过程

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摘要

In this paper, we address the reflow behavior of polymer thin films, focusing our effort on the accuracy of surface shape recognition. Although much work was already performed to control resist reflow during lens manufacturing for instance, our approach is significantly different since no contact line (substrate/ polymer/atmosphere) needs to be considered. Here, a linear stability approach is successfully developed to describe the thin film evolution which is also compared with experiments. Polystyrene films, with thickness ranging from few tens of nanometers up to several hundred of nanometers were patterned with Nanolmprint lithography technique. Atomic force microscopy measurements were used to characterize smooth or steep shapes, respectively. Mechanical measurements of earlier stages of pattern reflow were directly accessible without any assumption, contrary to the diffraction method usually employed. We show that by controlling the reflow process of any complex surface shape during the course of time, measurements of material parameters such as thin film viscosity, surface tension, or even Hamaker constant can be made possible.
机译：在本文中，我们解决了聚合物薄膜的回流行为，将精力集中在表面形状识别的准确性上。例如，尽管已经进行了大量工作来控制透镜制造过程中的抗蚀剂回流，但由于无需考虑接触线（基材/聚合物/大气），因此我们的方法有很大不同。在此，成功开发出一种线性稳定性方法来描述薄膜的演变，并将其与实验进行比较。使用Nanolmprint光刻技术对厚度范围从几十纳米到几百纳米的聚苯乙烯薄膜进行构图。原子力显微镜测量分别用于表征光滑或陡峭的形状。与通常使用的衍射方法相反，无需任何假设即可直接进行图案回流早期阶段的机械测量。我们证明，通过控制一段时间内任何复杂表面形状的回流过程，可以测量材料参数，例如薄膜粘度，表面张力甚至Hamaker常数。

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  • 来源
    《Microelectronic Engineering》 |2011年第8期|p.1867-1870|共4页
  • 作者

    T. Leveder; E. Rognin; S. Landis; L Davoust;

  • 作者单位

    CEA-LETI-Minatec, 17 rue des martyrs. 38054 Grenoble Cedex 9, France;

    CEA-LETI-Minatec, 17 rue des martyrs. 38054 Grenoble Cedex 9, France;

    CEA-LETI-Minatec, 17 rue des martyrs. 38054 Grenoble Cedex 9, France;

    CNRS-LECl. 17 me des martyrs, 38054 Grenoble Cedex 9, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    reflow; polymer; nanolmprint; afm;

    机译：回流;聚合物;nanolmprint;afm;

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