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A non-fluorine mold release agent for Ni stamp in nanoimprint process

机译：纳米压印工艺中用于镍印模的非氟脱模剂

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摘要

This study presents a novel material as an anti-adhesive layer between Ni mold stamps and polymethyl methacrylate (PMMA) substrate in nanoimprint process. A polybenzoxazine ((6,6'-bis(2,3-dihydro-3-methyl-4H-l,3-benzoxazinyl))) molecule self-assembled monolayer (PBO-SAM) considering as anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can be improve the nanoimprint process in Ni/PMMA substrates. In this work, the nanostructure-based Ni stamps and the imprinted PMMA mold are performed by electron-beam lithograph (EBL) and our homemade nanoimprint equipment, respectively. To control the forming of fabricated nanopattems, the simulation can be analyzed their effect of temperature distributions on the deformation of PBO-SAM/PMMA substrate during hot embossing lithography (HEL) process. Herein the diameter of pillar patterns is 200 nm with and 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this conforming condition, the results of Ni mold stamps infer over 90% improvement in controlling quality and quantity.
机译：这项研究提出了一种新型材料，作为纳米压印工艺中镍模具压模和聚甲基丙烯酸甲酯（PMMA）基材之间的防粘层。聚苯并恶嗪（（6,6'-双（2,3-二氢-3-甲基-4H-1,3-苯并恶嗪基））分子自组装单层（PBO-SAM）被认为是抗粘涂层剂非含氟化合物可以改善Ni / PMMA基材中的纳米压印工艺。在这项工作中，分别通过电子束光刻（EBL）和我们的自制纳米压印设备执行基于纳米结构的Ni压模和压印的PMMA模具。为了控制制造的纳米图案的形成，可以分析其温度分布对热压印光刻（HEL）过程中PBO-SAM / PMMA基板变形的影响。在此，柱状图案的直径在Ni印模表面上具有200nm的间距和400nm的间距。基于在这种贴合条件下的疏水性PBO-SAM表面，Ni模具压模的结果表明控制质量和数量方面可提高90％以上。

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