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MBE growth and processing of diluted nitride quantum well lasers on GaAs (111)B

机译:GaAs(111)B上的MBE生长和稀释的氮化物量子阱激光器的加工

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We have grown by Molecular Beam Epitaxy GaInNAs/GaAs (111)B quantum wells (QWs) embedded in p-i-n diode and laser diode structures. The impact of the different growth parameters (As flux, growth temperature, growth rate, ion density) on the optical and structural properties of this material is studied by Photoluminescence and Atomic Force Microscopy. Additionally, systematic studies of rapid thermal annealing cycles have been performed to optimize the laser structures. Finally, edge-emitting laser diodes have been processed using these structures. These devices showed room-temperature laser emission above 1.2 μm under pulsed current conditions.
机译:我们已经通过分子束外延GaInNAs / GaAs(111)B量子阱(QW)嵌入了p-i-n二极管和激光二极管结构中来生长。通过光致发光和原子力显微镜研究了不同生长参数(如通量,生长温度,生长速率,离子密度)对该材料的光学和结构性质的影响。另外,已经进行了快速热退火循环的系统研究以优化激光器结构。最后,已使用这些结构对边缘发射激光二极管进行了处理。这些设备在脉冲电流条件下显示出高于1.2μm的室温激光发射。

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