Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane

Marco A. R. Alves; Jonatas F. Rossetto; Olga Balachova

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Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane

机译：甲烷射频等离子体沉积制备非晶氢化碳薄膜的某些光学性质

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摘要

Amorphous hydrogenated carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition (PECVD) using methane. The optical properties of a-C:H films were investigated by reflectance and transmittance spectrometry in the visible and near-infrared regions. The dependence of refractive index, optical gap, and absorption coefficient are examined as a function of plasma power.

机译：使用甲烷通过等离子体增强化学气相沉积（PECVD）制备非晶态氢化碳（a-C：H）膜。通过反射和透射光谱法在可见光和近红外区域研究了a-C：H薄膜的光学特性。考察了折射率，光学间隙和吸收系数与等离子功率的关系。

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来源
《Microelectronics journal》 |2001年第9期|p.783-786|共4页
作者
Marco A. R. Alves; Jonatas F. Rossetto; Olga Balachova;
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作者单位

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种 eng
中图分类微电子学、集成电路（IC）;
关键词
Amorphous; PACVD; Radio frequency; Carbon; Refractive index;

机译：非晶态PACVD;无线电频率;碳;折光率;

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1. Optical properties of hydrogenated amorphous carbon thin films prepared by dc saddle field plasma-enhanced chemical vapor deposition [J] . Pisana S, OLeary SK, Zukotynski S Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2005,第8a9期

机译：直流鞍场等离子体增强化学气相沉积制备氢化非晶碳薄膜的光学性能
2. Structural and optical properties of Fe-doped hydrogenated amorphous carbon films prepared from trans-2-butene by plasma enhanced metal organic chemical vapor deposition [J] . Hongliang Zhang, Weidong Wu, Chengshi Gong, Applied Physics A: Materials Science & Processing . 2010,第4期

机译：反式-2-丁烯等离子体增强金属有机化学气相沉积法制备的Fe掺杂氢化非晶碳膜的结构和光学性质
3. Structural and optical properties of Fe-doped hydrogenated amorphous carbon films prepared from trans-2-butene by plasma enhanced metal organic chemical vapor deposition [J] . Hongliang Zhang, Weidong Wu, Chengshi Gong, Applied Physics A: Materials Science & Processing . 2010,第4期

机译：反式-2-丁烯等离子体增强金属有机化学气相沉积法制备的Fe掺杂氢化非晶碳膜的结构和光学性质
4. In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition [C] . A.D.Glew, M.A.Cappelli, M.N.Touzelbaev, Symposium on low-dielectric constant materials . 1999

机译：原位等离子体分析，通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入，热稳定性，应力和硬度比较
5. Investigation of the film properties and deposition process of hydrogenated amorphous carbon films deposited with a microwave ECR plasma reactor. [D] . Kim, Bo Keun. 2000

机译：用微波ECR等离子体反应器沉积氢化非晶碳膜的膜性能和沉积过程的研究。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. The structural and optical properties of hydrogenated amorphous carbon (a-C:H) thin films deposited using a direct current-plasma enhanced chemical vapour deposition (DC-PECVD) technique [O] . Abu Bakar Suriani 2005

机译：使用直流等离子体增强化学气相沉积（DC-PECVD）技术沉积的氢化非晶碳（a-C：H）薄膜的结构和光学性质
8. Optical Properties of Hydrogenated Amorphous Carbon Films Grown from Methane Plasma [R] . Pouch, J. J., Alterovitz, S. A., Warner, J. D., 1985

机译：甲烷等离子体制备氢化非晶碳膜的光学特性

Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane

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