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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research >Proton beam writing of long, arbitrary structures for microano photonics and fluidics applications
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Proton beam writing of long, arbitrary structures for microano photonics and fluidics applications

机译：适用于微/纳米光子学和流体学应用的任意结构的长质子束写入

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摘要

The last decade has seen proton beam writing maturing into a versatile lithographic technique able to produce sub-100 nm, high aspect ratio structures with smooth side walls. However, many applications in the fields of photonics and fluidics require the fabrication of structures with high spatial resolution that extends over several centimetres. This cannot be achieved by purely magnetic or electrostatic beam scanning due to the large off-axis beam aberrations in high demagnification systems. As a result, this has limited us to producing long straight structures using a combination of beam and stage scanning. In this work we have: (1) developed an algorithm to include any arbitrary pattern into the writing process by using a more versatile combination of beam and stage scanning while (2) incorporating the use of the ubiquitous AutoCAD DXF (drawing exchange format) into the design process. We demonstrate the capability of this approach in fabricating structures such as Y-splitters, Mach-Zehnder modulators and micro-fluidic channels that are over several centimetres in length, in polymer. We also present optimisation of such parameters as scanning speed and scanning loops to improve on the surface roughness of the structures. This work opens up new possibilities of using CAD software in PBW for microphotonics and fluidics device fabrication.
机译：在过去的十年中，质子束的书写逐渐发展成为一种通用的光刻技术，该技术可以生产100 nm以下，具有光滑侧壁的高纵横比结构。然而，在光子学和流体学领域的许多应用要求制造具有跨越数厘米的高空间分辨率的结构。由于高倍率系统中的大的离轴光束像差，这无法通过纯磁性或静电光束扫描来实现。结果，这限制了我们使用光束扫描和载物台扫描的组合来生产长直结构。在这项工作中，我们已经：（1）通过使用光束和载物台扫描的更通用的组合，开发了一种将任意图案包括在写入过程中的算法，同时（2）将无所不在的AutoCAD DXF（图形交换格式）的使用纳入设计过程。我们证明了这种方法在聚合物中制造结构的能力，例如Y型分离器，Mach-Zehnder调制器和长度超过几厘米的微流体通道。我们还提出了诸如扫描速度和扫描循环等参数的优化，以改善结构的表面粗糙度。这项工作开辟了在PBW中使用CAD软件进行微光子学和流体学设备制造的新可能性。

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  • 来源
    《Nuclear Instruments & Methods in Physics Research》 |2011年第20期|p.2417-2421|共5页
  • 作者

    Chammika Udalagama; E.J. Teo; S.F. Chan; V.S. Kumar; A.A. Bettiol; F. Watt;

  • 作者单位

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore;

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore;

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore NUS Nanoscience and Nanotechnology Initiative, 2 Science Drive 3, 117542, Singapore Department of Chemistry, NVS, 3 Science Drive 3, 117543, Singapore;

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore;

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore;

    Centre for Ion Beam Applications (CIBA), Department of Physics, National University of Singapore (NUS), 2 Science Drive 3, Singapore 117542, Singapore;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    ion lithography; proton beam writing; photonics; microfluidics;

    机译：离子光刻质子束书写光子学微流体;

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