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Integrating photonic and microfluidic structures on a device fabricated using proton beam writing

机译：在使用质子束写入制造的设备上集成光子和微流体结构

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Proton beam writing is a lithographic technique that can be used to fabricate microstructures in a variety of materials including PMMA, SU-8 and Foturan™. The technique utilizes a highly focused mega-electron volt beam of protons to direct write latent images into a material which are subsequently developed to form structures. Furthermore, the energetic protons can also be used to modify the refractive index of the material at a precise depth by using the end of range damage. In this paper we apply the proton beam writing technique to the fabrication of a lab-on-a-chip device that integrates buried waveguides with microfluidic channels. We have chosen to use Foturan™ photostructurable glass for the device because both direct patterning and refractive index modification is possible with MeV protons.

机译：质子束写入是一种光刻技术，可用于制造多种材料（包括PMMA，SU-8和Foturan™）中的微结构。该技术利用高度聚焦的质子兆电子伏特束将潜像写入材料，然后将其显影以形成结构。此外，高能质子还可以用于通过使用射程末端损伤来在精确的深度处改变材料的折射率。在本文中，我们将质子束写入技术应用于芯片实验室设备的制造中，该设备将掩埋波导与微流体通道集成在一起。我们选择使用Foturan™可光化玻璃作为设备，因为MeV质子既可以直接构图又可以改变折射率。

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来源
《MEMS, MOEMS, and Micromachining II》|2006年|P.61860F.1-61860F.8|共8页
会议地点 Strasbourg(FR)
作者
A. A. Bettiol; E.J. Teo; C.N.B. Udalagama; S. Venugopal Rao; J.A. van Kan; P. G. Shao; F. Watt;
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作者单位

Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 2 Science Dr 3 Singapore 117542;

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会议组织
原文格式 PDF
正文语种 eng
中图分类真空电子技术;
关键词
proton beam writing; glass; waveguides; micronuidics;

机译：质子束书写;玻璃;波导;微流体;

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专利

1. Embedded photonic structures fabricated in photosensitive glass using proton beam writing [J] . A.A. Bettiol, C.N.B. Udalagama, E.J. Teo, Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms . 2007,第1期

机译：使用质子束写入在光敏玻璃中制造的嵌入式光子结构
2. Proton beam writing of long, arbitrary structures for microano photonics and fluidics applications [J] . Chammika Udalagama, E.J. Teo, S.F. Chan, Nuclear Instruments & Methods in Physics Research . 2011,第20期

机译：适用于微/纳米光子学和流体学应用的任意结构的长质子束写入
3. Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing [J] . Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Microelectronic Engineering . 2011,第8期

机译：质子束写入法制备的高纵横比PMMA微结构用于压印光刻的Ni模具的电铸
4. Integrating photonic and microfluidic structures on a device fabricated using proton beam writing [C] . A. A. Bettiol, E. J. Teo, C. N. Udalagama, Conference on MEMS, MOEMS and Micromachining . 2006

机译：将光子和微流体结构集成在使用质子梁写入制造的装置上
5. Proton Beam Writing of 3D-Microstructure for Microfluidics and MEMS Applications [D] . Al-Shehri, Saad. 2016

机译：微流体和MEMS应用的3D微观结构质子束写入
6. Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method [O] . Zhiya Dang, Mark BH Breese, Gonzalo Recio-Sánchez, 2012

机译：质子束写入结合电化学刻蚀法制备的硅基光子晶体
7. Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method [O] . Zhiya Dang, Mark BH Breese, Gonzalo Recio-Sánchez, 2012

机译：质子束写入结合电化学刻蚀法制备的硅基光子晶体

Integrating photonic and microfluidic structures on a device fabricated using proton beam writing

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