Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

著录项

• 来源
  《Microelectronic Engineering》 |2011年第8期|p.2145-2148|共4页
• 作者

  Yusuke Tanabe; Hiroyuki Nishikawa; Yoshihiro Seki; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Tohru Watanabe; Atsushi Sekiguchi;

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• 作者单位

  Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;

  Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;

  Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;

  Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;

  Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;

  Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;

  Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;

  Litho Tech Japan Corporation, 2-6-6-201 Namiki, Kawaguchi, Saitama 332-0034, Japan;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  proton beam writing; mold; electroforming; imprint lithography;

  机译：质子束写入;模具;电铸;压印光刻;