机译:通过SILAR方法获得的In_2S_3薄膜的结构,形态和光学性质
L.P.M.C. Faculte des Sciences, Universite Ibn Tofail, 133-14000 Kenitra, Morocco;
L.P.M.C. Faculte des Sciences, Universite Ibn Tofail, 133-14000 Kenitra, Morocco;
LPMAER, Department of Physics, University Hassan Ⅱ FSTM Mohammedia, Mohammedia, Morocco;
LPMAER, Department of Physics, University Hassan Ⅱ FSTM Mohammedia, Mohammedia, Morocco;
Laboratori de Tecnologia Optoelectronica I Fotovoltaica, Universidad Politecnica de Valencia, Valencia, Spain;
L.P.M.C. Faculte des Sciences, Universite Ibn Tofail, 133-14000 Kenitra, Morocco;
L.P.M.C. Faculte des Sciences, Universite Ibn Tofail, 133-14000 Kenitra, Morocco;
In_2S_3; Thin films; SILAR method; Photovoltaic;
机译:低成本Sill方法的纯净和金属(Mn&Mg)掺杂ZnO薄膜的微结构,形态学和光学性质
机译:摩尔浓度对SILAR法制备CdS薄膜结构,形貌和光学性能的影响
机译:摩尔浓度对SILAR法制备的CdS薄膜结构,形貌和光学性能的影响
机译:SILAR法制备的CdS薄膜的结构和光学性质
机译:可溶液处理的半导体薄膜:形态,结构,光学和电荷传输性质之间的相关性
机译:YN掺杂和共掺杂TiO2薄膜的结构形态光学和光催化性能
机译:通过Sill方法合成TiO2薄膜,并研究退火对其结构,形态学和光学性质的影响