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Efficiency enhancement in Si solar cell using 1D quasi-periodic antireflection coating

机译：使用一维准周期抗反射涂层提高硅太阳能电池的效率

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摘要

In order to enhance the efficiency of thin-film Si solar cell, two well-known Fibonacci and Thue-Morse sequences of 1D quasi-periodic structures have been considered to achieve a broadband (300-1100 nm) planar antireflection coating, in this article. As almost non-absorbing materials in the solar spectrum, TiO2 and SiO2 with optimized thicknesses are considered to eliminate the reflections in the front side of the solar cell. An optimized bilayer antireflection coating with thicknesses of 54.4 nm and 85.6 nm respectively for the TiO2 and SiO2 layers has been obtained. Considering material dispersion and solar power spectrum (AM1.5), maximum efficiency enhancements of 42.78%, 46.15%, and 50% have been achieved for the 3 mu m thin-film Si solar cell using the FC(3,1) structure which correspond to the cells without any recombination, with bulk recombination, and with bulk and surface recombinations, respectively. The proposed quasi-periodic multilayer antireflection structures have been investigated and optimized using the TMM and FDTD methods. The electrical characteristic of the design is studied by the drift-diffusion method after extracting the electron-hole pair generation. Also, the stability of the performance of the proposed ARC against induced roughness in practice has been investigated and discussed.
机译：为了提高薄膜硅太阳能电池的效率，在本文中考虑了两个众所周知的一维准周期结构的斐波那契和Thue-Morse序列，以获得宽带（300-1100 nm）平面抗反射涂层， 。作为太阳光谱中几乎不吸收的材料，具有最佳厚度的TiO2和SiO2被认为可以消除太阳能电池正面的反射。获得了优化的双层减反射涂层，其厚度分别为TiO2和SiO2层，分别为54.4 nm和85.6 nm。考虑到材料分散和太阳能光谱（AM1.5），使用FC（3,1）结构的3μm薄膜硅太阳能电池的最大效率提高了42.78％，46.15％和50％。分别对应于没有任何重组，具有本体重组以及具有本体和表面重组的细胞。拟议的准周期多层减反射结构已通过TMM和FDTD方法进行了研究和优化。在提取电子-空穴对生成后，通过漂移-扩散方法研究设计的电气特性。而且，在实践中已经研究和讨论了所提出的ARC针对引起的粗糙度的性能的稳定性。

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