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High-carrier-frequency fan-out gratings fabricated by total internal reflection holographic lithography

机译:全内反射全息光刻技术制造的高载频扇出光栅

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摘要

Total internal reflection (TIR) holographic lithography is applied to the fabrication of binary diffractive optical elements with submi-crometer surface relief features. The recording conditions for the intermediate TIR volume hologram, used for high-resolution proximity printing, are discussed. In particular, the fabrication of efficient high-carrier-frequency fan-out gratings is considered and experimental results are presented for an off-axis 9 x 1 fan-out element in photoresist with a carrier frequency of 1000 lines/mm.
机译:全内反射(TIR)全息光刻技术被用于制造具有亚毫米级表面起伏特征的二元衍射光学元件。讨论了用于高分辨率接近打印的中间TIR体积全息图的记录条件。特别是,考虑了高效的高载频扇出光栅的制造,并给出了载流子为1000线/ mm的光致抗蚀剂中偏轴9 x 1扇出元件的实验结果。

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