...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Optical engineering >Fabrication error analysis for diffractive optical elements used in a lithography illumination system
【24h】

Fabrication error analysis for diffractive optical elements used in a lithography illumination system

机译：光刻照明系统中使用的衍射光学元件的制造误差分析

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

With the constant shrinking of printable critical dimensions in photolithography, off-axis illumination (OAI) becomes one of the effective resolution-enhancement methods facing these challenges. This, in turn, is driving much more strict requirements, such as higher diffractive efficiency of the diffractive optical elements (DOEs) used in the OAI system. Since the design algorithms to optimize DOEs' phase profile are improved, the fabrication process becomes the main limiting factor leading to energy loss. Tolerance analysis is the general method to evaluate the fabrication accuracy requirement, which is especially useful for highly specialized deep UV applications with small structures and tight tolerances. A subpixel DOE simulation model is applied for tolerance analysis of DOEs by converting the abstractive fabrication structure errors into quantifiable subpixel phase matrices. Adopting the proposed model, four kinds of fabrication errors including misetch, misalignment, feature size error, and feature rounding error are able to be investigated. In the simulation experiments, systematic fabrication error studies of five typical DOEs used in 90-nm scanning photolithography illumination system are carried out. These results are valuable in the range of high precision DOE design algorithm and fabrication process optimization.
机译：随着光刻中可打印关键尺寸的不断缩小，离轴照明（OAI）成为面对这些挑战的有效分辨率提高方法之一。反过来，这驱动了更严格的要求，例如OAI系统中使用的衍射光学元件（DOE）的更高衍射效率。由于改进了优化DOE相轮廓的设计算法，因此制造工艺成为导致能量损失的主要限制因素。公差分析是评估制造精度要求的通用方法，对于高度专业化的深紫外线应用（其具有小的结构和严格的公差）特别有用。通过将抽象的制造结构误差转换为可量化的子像素相位矩阵，将子像素DOE仿真模型应用于DOE的公差分析。采用提出的模型，可以研究四种制造误差，包括误蚀刻，错位，特征尺寸误差和特征舍入误差。在仿真实验中，对90纳米扫描光刻照明系统中使用的五个典型DOE进行了系统制造误差研究。这些结果在高精度DOE设计算法和制造工艺优化的范围内具有重要价值。

著录项

  • 来源
    《Optical engineering》 |2015年第4期|045102.1-045102.8|共8页
  • 作者

    Jian Wang; Fang Zhang; Qiang Song; Aijun Zeng; Jing Zhu; Huijie Huang;

  • 作者单位

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China,University of the Chinese Academy of Sciences, No. 19 Yuquan Road, Shijingshan District, Beijing 100049, China;

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China,University of the Chinese Academy of Sciences, No. 19 Yuquan Road, Shijingshan District, Beijing 100049, China;

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China,University of the Chinese Academy of Sciences, No. 19 Yuquan Road, Shijingshan District, Beijing 100049, China;

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China;

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China;

    Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    diffractive optical elements; fabrication error; off-axis illumination; photolithography;

    机译：衍射光学元件;制造错误;离轴照明;光刻;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号