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Fabrication of multilevel resist patterns by using a liquid crystal mask

机译：使用液晶掩模制作多层抗蚀剂图案

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Photolithographic processes of multilevel features in microfluidics can be complex and expensive. This paper demonstrates a quick method for manufacturing multilevel patterns, which is based on liquid crystal display masking during a standard lithography process for master mold fabrication for the polydimethysiloxane replica process. An active mask, based on a liquid crystal display, can simplify the process due to the ability to quickly modify designs and reduce the overhead for alignment between mask levels. The possibility of multilevel patterning, with the help of active masking, creates new opportunities for optical lithography processes. We have developed the process for a standard, mercury lamp exposure mask aligner system. The patterning characteristics were evaluated with a step pattern fabricated as an example of three-dimensional patterning for multilevel structuring. The application of a liquid crystal mask for resist contrast measurements was demonstrated.
机译：微流体中多级特征的光刻工艺可能是复杂且昂贵的。本文演示了一种用于制造多层图案的快速方法，该方法基于在标准光刻工艺中用于聚二甲基硅氧烷复制工艺的主模制造过程中的液晶显示器掩膜。基于液晶显示器的有源掩膜可以快速修改设计并减少掩膜级之间对准的开销，因此可以简化工艺。在主动掩膜的帮助下进行多级图案化的可能性为光刻工艺创造了新的机会。我们已经开发了用于标准汞灯曝光掩模对准仪系统的工艺。使用作为用于多层构造的三维图案化的实例而制造的阶梯图案来评估图案化特性。演示了液晶掩模在抗蚀剂对比度测量中的应用。

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