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Engineering of luminescence from Gd_2O_3:Eu~(3+) nanophosphors by pulsed laser deposition

机译:脉冲激光沉积技术对Gd_2O_3:Eu〜(3+)纳米磷光体的发光工程

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摘要

Nanostructured Gd_2O_3:Eu~(3+) thin films were prepared by pulsed laser ablation technique. The dependence of structural, morphological and optical properties of these films on photoluminescence was systematically studied by varying the annealing temperature, Eu~(3+) incorporation concentration and laser fluence. The intensity of the XRD peak from (2 2 2) crystal plane was found to increase with annealing temperature in the range 973-1173 K. Films annealed at 1173 K show a preferential growth along (222) crystal plane of the cubic Gd_2O_3 and enhanced photoluminescence at 612 nm. XRD and Micro-Raman spectra and lattice strain investigations suggest that Eu~(3+) incorporation introduce a strong lattice distortion in Gd_2O_3 matrix. Morphological investigations using atomic force microscopy indicate a strong influence of the annealing process on the surface roughness and particle size. This kind of transparent thin film phosphors may promise for applications in flat-panel displays and X-ray imaging systems.
机译:采用脉冲激光烧蚀技术制备了纳米结构的Gd_2O_3:Eu〜(3+)薄膜。通过改变退火温度,Eu〜(3+)掺入浓度和激光通量,系统地研究了这些薄膜的结构,形态和光学性质对光致发光的依赖性。发现(2 2 2)晶面的XRD峰强度随退火温度在973-1173 K范围内增加。在1173 K退火的薄膜沿立方Gd_2O_3的(222)晶面显示优先生长并增强在612 nm处有光致发光。 XRD和显微拉曼光谱以及晶格应变研究表明,Eu〜(3+)的引入在Gd_2O_3基体中引入了强烈的晶格畸变。使用原子力显微镜的形态学研究表明,退火过程对表面粗糙度和粒径有很大的影响。这种透明的薄膜磷光体有望应用于平板显示器和X射线成像系统。

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