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Preparation and optical characterization of e-beam deposited cerium oxide films

机译：电子束沉积氧化铈薄膜的制备和光学表征

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Cerium oxide films, of 0.3-1 μm thickness, were reactively deposited in the oxygen atmosphere onto quartz plates by the PVD method. An electron gun was used as an evaporation source. Films were characterized with the AFM method, Raman spectroscopy and spectrophotometrically. Optical properties of these films were examined for the wavelength range 0.2-2.5 μm. Films were characterized by high transparency, between 0.38 and 2.5 urn. The complex refractive index, n~*=n - jk, was evaluated. The dispersion characteristics for n(λ) and k(λ) were presented. We found that the refractive index strongly depends on the temperature of substrates (300 K ≤ T_s ≤ 673 K) during film deposition. Estimated values of the refractive index (at λ = 0.55 urn) were in the range 1.91-2.34.
机译：通过PVD方法在氧气气氛中将0.3-1μm厚的氧化铈膜反应性沉积到石英板上。电子枪用作蒸发源。用AFM方法，拉曼光谱和分光光度法对薄膜进行表征。在0.2-2.5μm的波长范围内检查了这些膜的光学性质。薄膜的特点是透明度高，介于0.38至2.5微米之间。评估了复折射率n〜* = n-jk。给出了n（λ）和k（λ）的色散特性。我们发现，折射率在很大程度上取决于薄膜沉积过程中基板的温度（300 K≤T_s≤673 K）。折射率的估计值（在λ= 0.55 um时）在1.91-2.34范围内。

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