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Analytical model for the current density in the electrochemical synthesis of porous silicon structures with a lateral gradient

机译:具有横向梯度的多孔硅结构电化学合成电流密度的分析模型

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摘要

Layered optical devices with a lateral gradient can be fabricated through electrochemical synthesis of porous silicon (PS) using a position dependent etching current density j(r(parallel to)). Predicting the local value of j(r(parallel to)) and the corresponding porosity p(r(parallel to)) and etching rate v(r(parallel to)) is desirable for their systematic design. We develop a simple analytical model for the calculation of j(r(parallel to)) within a prism shaped cell. Graded single layer PS samples were synthesized and their local calibration curves p vsj and v vs j were obtained from our model and their reflectance spectra. The agreement found between the calibration curves from different samples shows that from one sample we could obtain full calibration curves which may be used to predict, design, and fabricate more complex non-homogeneous multilayered devices with lateral gradients for manifold applications.
机译:通过使用位置所需的蚀刻电流密度J(R(平行于)),可以通过多孔硅(PS)的电化学合成来制造具有横向梯度的分层光学器件。 预测J(R(平行于))和相应的孔隙率P(R(平行于))和蚀刻速率V(R(平行于))的局部值对于其系统的设计是期望的。 我们开发了一个简单的分析模型,用于计算棱镜形状细胞内的J(R(平行于))。 合成分级单层PS样品,并从我们的模型及其反射光谱获得它们的局部校准曲线P VSJ和V VS j。 来自不同样本的校准曲线之间的协议表明,从一个样品我们可以获得具有用于预测,设计和制造更复杂的非均匀多层器件的完全校准曲线,用于具有歧管应用的横向梯度。

著录项

  • 来源
    《Optical Materials》 |2021年第3期|110859.1-110859.10|共10页
  • 作者单位

    Univ Autonoma Estado Morelos UAEM Ctr Invest Ingn & Ciencias Aplicadas CIICAp IICBA Cuernavaca 62209 Morelos Mexico;

    Univ Autonoma Estado Morelos UAEM Ctr Invest Ingn & Ciencias Aplicadas CIICAp IICBA Cuernavaca 62209 Morelos Mexico|Univ Nacl Autonoma Mexico Inst Ciencias Fis Av Univ S-N Cuernavaca 62210 Morelos Mexico;

    Univ Nacl Autonoma Mexico Inst Ciencias Fis Av Univ S-N Cuernavaca 62210 Morelos Mexico;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Porous silicon; GRIN; Reflectance spectra;

    机译:多孔硅;笑;反射光谱;

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