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首页> 外文期刊>Optical Materials >CW laser damage study in Ag/TiO_2 bilayer thin films: Role of interfacially diffused plasmonic silver nanoparticles
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CW laser damage study in Ag/TiO_2 bilayer thin films: Role of interfacially diffused plasmonic silver nanoparticles

机译：Ag / TiO_2双层薄膜中的CW激光损伤研究：界面扩散等离子体纳米粒子的作用

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摘要

CW laser (532 nm) induced damage mechanism has been studied on Ag/TiO2 bilayer thin films exhibiting diffused silver mediated plasmonic absorption. The thin films were deposited by e-beam evaporation technique under various O2 flow conditions in the range of 0 & ndash;20 sccm. The required exposure time (tD) for onset of damage under irradiance of 37 W/cm2 has been measured to be in the range from 118 to 1244 s. Standing Wave Electric Field (SWEF) distribution has been simulated for all the Ag/TiO2 bilayer thin films based on the film optical constants retrieved from spectroscopic ellipsometry analysis. It has been observed that tD is mainly governed by two primary factors (in 2 & ndash;16 sccm range) visualizing the shift of SWEF peak position with respect to Ag/TiO2 interface and the possible increase in thermal conductivity of TiO2 controlled by diffused Ag concentration across the interface. The SWEF magnitude and light absorbance seems to have relatively lesser bearing on laser withstanding time. Beyond 16 sccm, tD slightly decreases due to increase in surface roughness of the film. The required exposure time, tD is the highest for 0 sccm sample of which there is negligible interfacial Ag diffusion. All these results suggest that interfacially diffused plasmonic silver nanoparticles play an important role in deciding laser dose withstandability of Ag/TiO2 bilayer thin film system through control of electric field distribution and possibly thermal conductivity of TiO2 layer.
机译：CW激光（532nm）诱导损伤机理已经研究了展示扩散银介导的血浆吸收的Ag / TiO2双层薄膜。在0＆ndash的各种O2流动条件下通过电子束蒸发技术沉积薄膜; 20 sccm。在37W / cm 2的辐照下造成损伤的发生时间（TD）已经测量为118至1244秒。已经基于从光谱椭圆形分析检出的膜光学常数的所有Ag / TiO2双层薄膜模拟了站立波电场（SWEF）分布。已经观察到TD主要由两个主要因素（2和Ndash; 16 SCCM范围）来控制于AG / TiO2接口的SWEF峰值位置的偏移以及由扩散AG控制的TiO2的热导率的可能增加集中在界面上。 SWEF幅度和光吸光度似乎在激光耐时具有相对较小的轴承。超过16 sccm，由于薄膜的表面粗糙度的增加，Td略微降低。所需的曝光时间，TD是0个SCCM样本的最高，界面AG扩散可忽略不计。所有这些结果表明，界面扩散的等离子体纳米粒子在通过控制TiO2层的电场分布和可能导热率来决定Ag / TiO2双层薄膜系统的激光剂量耐受性的重要作用。

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  • 来源
    《Optical Materials》 |2021年第7期|111135.1-111135.5|共5页
  • 作者

    Haque S. Maidul; De Rajnarayan; Prathap C.; Kumar Sanjiv; Reddy G. L. N.; Mishra Shobhna; Rao K. Divakar;

  • 作者单位

    Bhabha Atom Res Ctr Facil Atom & Mol Phys Div Photon & Nanotechnol Sect Visakhapatnam 531011 Andhra Pradesh India;

    Bhabha Atom Res Ctr Facil Atom & Mol Phys Div Photon & Nanotechnol Sect Visakhapatnam 531011 Andhra Pradesh India|Homi Bhabha Natl Inst Mumbai 400094 Maharashtra India;

    Bhabha Atom Res Ctr Facil Atom & Mol Phys Div Photon & Nanotechnol Sect Visakhapatnam 531011 Andhra Pradesh India;

    BARC ECIL Natl Ctr Composit Characterizat Mat Hyderabad 500062 India;

    BARC ECIL Natl Ctr Composit Characterizat Mat Hyderabad 500062 India;

    Bhabha Atom Res Ctr Facil Pulsed Power & Electromagnet Div Visakhapatnam 531011 Andhra Pradesh India;

    Bhabha Atom Res Ctr Facil Atom & Mol Phys Div Photon & Nanotechnol Sect Visakhapatnam 531011 Andhra Pradesh India|Homi Bhabha Natl Inst Mumbai 400094 Maharashtra India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ag-TiO2 thin film; Electron beam evaporation; Localized surface plasmon resonance; Spectroscopic ellipsometry; Continuous wave laser; Laser damage;

    机译：AG-TiO2薄膜;电子束蒸发;局部表面等离子体共振;光谱椭圆形测定法;连续波激光;激光损坏;

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