Vacuum–ultraviolet blazed silicon grating anisotropically etched by native-oxide mask

Bin Sheng Xiangdong Xu Ying Liu Yilin Hong Hongjun Zhou Tonglin Huo and Shaojun Fu

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Vacuum–ultraviolet blazed silicon grating anisotropically etched by native-oxide mask

机译：天然氧化物掩模各向异性刻蚀真空-紫外闪耀硅栅

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We describe a simple and convenient method of controlling the proﬁle of a blazed grating that consists ofnusing a patterned native-oxide layer of off-cut silicon (111) wafers as the mask of anisotropic etching to maxi-nmize the smooth blaze facets of the desired blaze angle and to minimize the deﬁciencies of the groove apexes.nWith the blazed-grating proﬁle well controlled by this technique, a 1200 g/mm blazed grating was fabri-ncated that had a blaze angle of 5.0° and smooth blaze facets of about 0.2 nm rms. It was measured to havenblaze efﬁciency in the vacuum–ultraviolet wavelength region. © 2009 Optical Society of America

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《Optics Letters》 |2009年第8期|p.1147-1149|共3页
作者
Bin Sheng Xiangdong Xu Ying Liu Yilin Hong Hongjun Zhou Tonglin Huo and Shaojun Fu;
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National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China* Corresponding author: sjfu@ustc.edu.cn;

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1. Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask [J] . Bin Sheng, Xiangdong Xu, Ying Liu, Optics Letters . 2009,第8期

机译：天然氧化物掩模各向异性刻蚀真空紫外闪耀硅光栅
2. Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating [J] . Michael P. Kowalski, Ralf K. Heilmann, Mark L. Schattenburg, Applied Optics . 2006,第8期

机译：平板晶体各向异性刻蚀光栅的接近法线入射的极紫外效率
3. Fabrication of silicon-blazed phase diffractive gratings using grey scale gallium implantation with KOH anisotropic etch [J] . Edward Coyne, Gerard M. OConnor Journal of Micromechanics and Microengineering . 2010,第8期

机译：使用KOH各向异性刻蚀的灰度镓注入法制备硅闪耀相位衍射光栅
4. Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar_2-CHF_3 ion-beam etching through a rectangular photoresist mask [C] . TAN Xin International symposium on photoelectronic detection and imaging;ISPDI 2011 . 2012

机译：通过矩形光致抗蚀剂掩模通过直接Ar_2-CHF_3离子束刻蚀制造高效紫外火焰光栅
5. Computer-aided mask layout synthesis for anisotropic etch photolithography. [D] . Long, Mark K. 1999

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6. Ultracompact and high efficient silicon-based polarization splitter-rotator using a partially-etched subwavelength grating coupler [O] . Yin Xu, Jinbiao Xiao -1

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7. External cavity laser with a vertically etched silicon blazed grating [O] . Lohmann A, Syms RRA 2003

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8. Absolute Intensities of the Vacuum Ultraviolet Spectra in Oxide Etch Plasma Processing Discharges;Journal of Vacuum Science and Technology [R] . Woodworth, Riley, Amatucci, 2000

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Vacuum–ultraviolet blazed silicon grating anisotropically etched by native-oxide mask

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