Extreme ultraviolet multilayer mirror with near-zero IR reflectance

W. A. Soer1* P. Gawlitza2 M. M. J. W. van Herpen1 M. J. J. Jak1 S. Braun2 P. Muys3 and V. Y. Banine4

首页> 外文期刊>Optics Letters >Extreme ultraviolet multilayer mirror with near-zero IR reflectance

【24h】

Extreme ultraviolet multilayer mirror with near-zero IR reflectance

机译：具有近零红外反射率的极紫外多层镜

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation that has low reflectance for IR radiation at 10.6 μmwavelength. The mirror is based on a multilayer coating comprising alternating layers of diamondlike carbon and silicon, for which we demonstrate an EUV reflectance of up to 49.7%. We have made a functional prototype in which the multilayer coating is included as part of an antireflection coating for IR radiation, resulting in reflectance values of 42.5% and 4.4% for EUV and IR, respectively. The mirror can replace a standard Mo/Si mirror in an EUV lithography tool to form an efficient solution for the suppression of unwanted CO2laser radiation.

机译：我们已经开发了一种用于极端紫外线（EUV）辐射的多层反射镜，该反射镜对于波长为10.6μm的红外辐射具有低反射率。镜子基于多层涂层，该多层涂层包括类金刚石碳和硅的交替层，为此我们证明其EUV反射率高达49.7％。我们制作了一个功能原型，其中将多层涂层作为用于IR辐射的抗反射涂层的一部分，因此EUV和IR的反射率分别为42.5％和4.4％。该反射镜可以替代EUV光刻工具中的标准Mo / Si反射镜，从而形成抑制有害CO2激光辐射的有效解决方案。

著录项

来源
《Optics Letters》 |2009年第23期|p.3680-3682|共3页
作者
W. A. Soer1* P. Gawlitza2 M. M. J. W. van Herpen1 M. J. J. Jak1 S. Braun2 P. Muys3 and V. Y. Banine4;
展开▼
作者单位

1Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands 2Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, 01277 Dresden, Germany 3Lambda Research Optics Europe, Tulpenstraat 2, 9810 Eke, Belgium 4ASML, De Run 6501, 5504 DR Veldhoven, The Netherlands;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类
关键词

相似文献

外文文献
中文文献
专利

1. Extreme ultraviolet multilayer mirror with near-zero IR reflectance [J] . W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, Optics Letters . 2009,第23期

机译：具有近零红外反射率的极紫外多层镜
2. Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths [J] . Bayraktar M., Wessels W.A., Lee C.J., Journal of Physics, D. Applied Physics: A Europhysics Journal . 2012,第49期

机译：有源多层反射镜可在极端紫外线（EUV）波长下进行反射率调整
3. Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments [J] . Masahito Niibe, Keigo Koida, Yukinobu Kakutani, Japanese journal of applied physics . 2011,第6Issue2期

机译：在不同真空环境下，高通量极紫外光照射下，极紫外光刻光学多层反射镜反射率的非线性行为
4. Al/ Ir multilayers for high reflectance in the extreme ultraviolet longward of 50 nm [C] . Juan I. Larruquert, Jose A. Mendez, Jose A. Aznarez Conference on Instrumentation for UV/EUV Astronomy and Solar Missions, Jul 30-Aug 1, 2000, San Diego, USA . 2000

机译：Al / Ir多层膜可在50 nm的极紫外光下获得高反射率
5. New materials for multilayer mirrors in the extreme ultraviolet region. [D] . Hiller, Uli. 2002

机译：极紫外区域中用于多层反射镜的新材料。
6. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet [O] . D. Kiefer, M. Yeung, T. Dzelzainis, -1

机译：纳米箔的相对论性电子镜可将相干频率升频至极紫外
7. Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths [O] . Bayraktar M., Wessels W.A., Lee C.J., 2012

机译：有源多层反射镜，用于在极紫外（EUV）波长下进行反射调谐
8. Advances in the reduction and compensation of film stress in high- reflectance multilayer coatings for extreme ultraviolet lithography applications [R] . Mirkarimi, P. B. 1998

机译：用于极紫外光刻应用的高反射率多层涂层中薄膜应力的减少和补偿的进展

Extreme ultraviolet multilayer mirror with near-zero IR reflectance

摘要

著录项

相似文献

相关主题

期刊订阅