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p-Type a-Si:H/ZnO:Al and μc-Si:H/ZnO:Al Thin-Film Solar Cell Structures—A Comparative Hard X-Ray Photoelectron Spectroscopy Study

机译:p型a-Si:H / ZnO:Al和μc-Si:H / ZnO:Al薄膜太阳能电池结构-对比硬X射线光电子能谱研究

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摘要

The chemical and electronic properties of a-Si:H(B)/ZnO:Al and μc-Si:H(B)/ZnO:Al thin-film solar cell structures are studied by hard X-ray photoelectron spectroscopy (HAXPES). Using a combination of different X-ray excitation energies and deliberate sample design, we were able to select the probed volume, i.e., the silicon capping layer only or the silicon and zinc oxide layer (including the buried interface). For the a-Si:H(B) material, we find a higher deposition rate and a smaller value for the modified Auger parameter than for μc-Si:H(B). In addition, we find indications of a pronounced band bending limited to the very surface of the a-Si:H(B) and the μc-Si:H(B) layers, which is more distinct in the latter case.
机译:通过硬X射线光电子能谱(HAXPES)研究了a-Si:H(B)/ ZnO:Al和μc-Si:H(B)/ ZnO:Al薄膜太阳能电池的化学和电子性质。结合使用不同的X射线激发能和经过精心设计的样品设计,我们能够选择被探测的体积,即仅硅覆盖层或硅和氧化锌层(包括掩埋界面)。对于a-Si:H(B)材料,我们发现,与μc-Si:H(B)相比,修改后的俄歇参数的沉积速率更高,值更小。另外,我们发现明显的带弯曲的迹象仅限于a-Si:H(B)和μc-Si:H(B)层的表面,在后一种情况下更为明显。

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