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首页> 外文期刊>Physica status solidi >Multicrystalline silicon thin film solar cells on glass with epitaxially grown emitter prepared by a two-step laser crystallization process
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Multicrystalline silicon thin film solar cells on glass with epitaxially grown emitter prepared by a two-step laser crystallization process

机译：通过两步激光结晶工艺制备的具有外延生长发射极的玻璃上的多晶硅薄膜太阳能电池

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摘要

In this paper, we demonstrate a two-step laser crystallization process for thin film silicon solar cells on glass. In a first step a 5 μm thick amorphous silicon layer is crystallized by a diode laser to get the absorber. The multicrystalline layer consists of grains with sizes in the range of 1 mm to 10 mm. In a second step a thin amorphous silicon layer is epitaxially crystallized by an excimer laser to form the emitter.Epitaxy was investigated in a fluence range of 700 to 1200 mJ/cm~2. The resulting thickness of the emitter is measured and numerically simulated, both resulting in 185 nm for a fluence of 1100 mJ/cm~2. The solar cells achieve maximum open circuit voltages of 548 mV, short-circuit current densities of up to 22.0 mA/cm~2 and an efficiency of 8.0%.
机译：在本文中，我们演示了玻璃上的薄膜硅太阳能电池的两步激光结晶过程。第一步，用二极管激光器使5μm厚的非晶硅层结晶，得到吸收体。所述多晶层由尺寸在1mm至10mm范围内的晶粒组成。第二步，用准分子激光器将非晶硅薄层外延结晶，形成发射极。研究了外延在700到1200 mJ / cm〜2的注量范围。测量得到的发射器的厚度并进行数值模拟，对于1100 mJ / cm〜2的注量，二者均产生185 nm。太阳能电池的最大开路电压为548 mV，短路电流密度高达22.0 mA / cm〜2，效率为8.0％。

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  • 来源
    《Physica status solidi》 |2015年第1期|162-165|共4页
  • 作者

    A. Gawlik; J. Plentz; I. Hoeger; G. Andrae; T. Schmidt; U. Brueckner; F. Falk;

  • 作者单位

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

    Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    epitaxy; laser crystallization; multicrystalline materials; silicon; solar cells; thin films;

    机译：外延激光结晶多晶材料硅;太阳能电池;薄膜;

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