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Strongly interacting phases of metallic wires in strong magnetic field

机译：金属线在强磁场中的强相互作用相

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摘要

We investigate theoretically an interacting metallic wire with a strong magnetic field directed along its length and show that it is a highly tunable one-dimensional system. By considering a suitable change in spatial geometry, we build an analogy between the problem in the zeroth Landau level with Landau level degeneracy N to one-dimensional fermions with an N-component pseudospin degree of freedom and SU(2)-symmetric interactions. This analogy allows us to establish the phase diagram as a function of the interactions for small N (and make conjectures for large N) using renormalization group and bosonization techniques. We find pseudospin-charge separation with a gapless U(l) charge sector and several possible strong-coupling phases in the pseudospin sector. For odd N, we find a fluctuating pseudospin-singlet charge density wave phase and a fluctuating pseudospin-singlet superconducting phase which are topologically distinct. For even N > 2, similar phases exist, although they are not topologically distinct, and an additional novel pseudospin-gapless phase appears. We discuss experimental conditions for observing our proposals.
机译：我们从理论上研究了相互作用的金属线，该金属线沿其长度方向具有强磁场，并表明它是高度可调的一维系统。通过考虑空间几何形状的适当变化，我们在具有Landau能级简并性N的零Landau能级与具有N分量伪自旋自由度和SU（2）对称相互作用的一维费米子之间建立了一个类比。这种类比使我们能够使用重归一化组和玻色化技术根据小N（与大N的猜想）的相互作用来建立相图。我们发现伪自旋电荷分离具有无间隙的U（l）电荷扇区和伪自旋扇区中的几个可能的强耦合相。对于奇数N，我们发现波动的伪自旋-小电荷密度波相位和波动的伪自旋-小电荷超导相位在拓扑上是不同的。即使N> 2，也存在相似的相，尽管它们在拓扑结构上并没有区别，并且出现了另一个新的伪自旋无间隙相。我们讨论遵守建议的实验条件。

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  • 来源
    《Physical review》 |2017年第4期|045134.1-045134.22|共22页
  • 作者

    Daniel Bulmash; Chao-Ming Jian; Xiao-Liang Qi;

  • 作者单位

    Department of Physics, Stanford University, Stanford, California 94305-4045, USA;

    Kavli Institute for Theoretical Physics, University of California, Santa Barbara, California, 93106, USA,Station Q, Microsoft Research, Santa Barbara, California 93106-6105, USA;

    Department of Physics, Stanford University, Stanford, California 94305-4045, USA;

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