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Thickness dependence of spin Hall angle of Au grown on Y_3Fe_5O_(12) epitaxial films

机译:Y_3Fe_5O_(12)外延膜上生长的Au自旋霍尔角的厚度依赖性

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摘要

We measure the spin Hall angle in Au layers of 5-100 nm thicknesses by spin pumping from Y_3Fe_5O_(12) epitaxial films grown by ultrahigh vacuum, off-axis sputtering. We observe a striking increase in the spin Hall angle for Au layers thinner than the measured spin diffusion length of 12.6 nm. In particular, the 5 nm Au layer shows a large spin Hall angle of 0.087, compared to those of 0.016 and 0.017 for the 50 and 100 nm Au layers, respectively, suggesting that the top surface plays a dominant role in spin Hall physics when the spin current is able to reach it. Other spin pumping related parameters, including Gilbert damping enhancement, interfacial spin mixing conductance, and spin current are also determined for Au layers of various thicknesses. Given the pervasive role of ultrathin films in electrical and spin transport applications, this result emphasizes the importance of considering the impact of the top surface and reveals the possibility of tuning critical spin parameters by film thickness.
机译:我们通过从Y_3Fe_5O_(12)外延薄膜中通过超高真空,离轴溅射生长的自旋泵浦来测量5-100 nm厚度的Au层中的自旋霍尔角。对于比测得的12.6 nm的自旋扩散长度更薄的Au层,我们观察到自旋霍尔角的显着增加。特别是,5 nm的Au层显示出0.087的大自旋霍尔角,而50和100 nm的Au层的自旋霍尔角分别为0.016和0.017。自旋电流能够达到它。还为各种厚度的金层确定了其他与自旋泵相关的参数,包括吉尔伯特阻尼增强,界面自旋混合电导和自旋电流。考虑到超薄膜在电气和自旋传输应用中的普遍作用,该结果强调了考虑顶面影响的重要性,并揭示了通过薄膜厚度调节关键自旋参数的可能性。

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  • 来源
    《Physical review》 |2016年第5期|054418.1-054418.6|共6页
  • 作者单位

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Center for Electron Microscopy and Analysis, Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43212, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Center for Electron Microscopy and Analysis, Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43212, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA;

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