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Magnetism of epitaxial Tb films on W(110) studied by spin-polarized low-energy electron microscopy

机译:自旋极化低能电子显微镜研究W(110)上外延Tb薄膜的磁性

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摘要

Thin epitaxial films of Tb metal were grown on a clean W(110) substrate in ultrahigh vacuum and studied in situ by low-energy electron microscopy. Annealed films present magnetic contrast in spin-polarized low-energy electron microscopy. The energy dependence of the electron reflectivity was determined and a maximum value of its spin asymmetry of about 1% was measured. The magnetization direction of the Tb films is in-plane. Upon raising the temperature, no change in the domain distribution is observed, while the asymmetry in the electron reflectivity decreases when approaching the critical temperature, following a power law ~(1 - T/T_c)~β with a critical exponent β of 0.39.
机译:在超高真空下,在干净的W(110)衬底上生长Tb金属的外延薄膜,并通过低能电子显微镜原位研究。退火后的薄膜在自旋极化低能电子显微镜中呈现出磁性对比。确定电子反射率的能量依赖性,并测量其自旋不对称性的最大值约1%。 Tb膜的磁化方向是面内的。在升高温度时,未观察到畴分布的变化,而当接近临界温度时,遵循幂指数〜(1-T / T_c)〜β,临界指数β为0.39,电子反射率的不对称性减小。

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  • 来源
    《Physical review》 |2016年第17期|174445.1-174445.6|共6页
  • 作者单位

    Centro de Microanalisis de Materiales, Dpto. de Fisica de la Materia Condensada, IFIMAC and Instituto 'Nicolas Cabrera' Universidad Autonoma de Madrid, E-28049 Madrid, Spain;

    Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Instituto de Quimica Fisica 'Rocasolano', CSIC, Madrid 28006, Spain;

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