Surface-phonon dispersion of a NiO(100) thin film

K. L. Rostov; S. Polzin; S. K. Saha; O. Brovko; V. Stepanyuk; W. Widdra

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Surface-phonon dispersion of a NiO(100) thin film

机译：NiO（100）薄膜的表面声子色散

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A well-ordered 25 ML epitaxial NiO(100) film on Ag(100) as prepared by layer-by-layer growth has been characterized by high-resolution electron energy loss spectroscopy. Six different phonon branches have been identified in the Γ X direction of the surface Brillouin zone and are compared with first-principles phonon calculations. Whereas the surface Rayleigh mode shows a strong upward dispersion of 173 cm~(-1) in agreement with observations for the NiO(l00) single crystal, the other surface phonons and surface resonances show only smaller dispersion widths in Γ X direction. The Wallis and the Lucas phonons are localized at 425 and 367 cm~(-1) at the Γ point, respectively. Additionally, two phonons are identified that have stronger weight at the zone boundary at 194 and 285 cm~(-1) and that become surface resonances at the zone center. The dominant spectral feature is the Fuchs-Kliewer (FK) phonon polariton at 559 cm~(-1), which is excited by dipole scattering and exhibits a rather broad non-Lorentzian lineshape. The lineshape is explained by a FK splitting resulting from the splitting of bulk optical phonons due to antiferromagnetic order. This view is supported by calculations of the surface-loss function from bulk reflectivity data.

机译：通过逐层生长制备的在Ag（100）上有序排列的25 ML外延NiO（100）膜已通过高分辨率电子能量损失谱进行了表征。在表面布里渊区的X方向上已经确定了六个不同的声子分支，并与第一性原理声子计算进行了比较。表面瑞利模式显示出173 cm〜（-1）的强烈向上色散，这与对NiO（100）单晶的观察结果一致，而其他表面声子和表面共振在ΓX方向上仅显示出较小的色散宽度。 Wallis和Lucas声子分别位于Γ点的425和367 cm〜（-1）处。此外，还发现了两个声子，它们在194和285 cm〜（-1）的区域边界处具有较重的权重，并在区域中心处成为表面共振。谱的主要特征是在559 cm〜（-1）处的Fuchs-Kliewer（FK）声子极化子，它被偶极子散射激发并表现出相当宽的非洛伦兹线形。线形可以通过FK分裂来解释，该分裂是由于反铁磁有序分裂体声子而产生的。根据整体反射率数据计算表面损耗函数可以支持此视图。

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来源
《Physical review》 |2013年第23期|235416.1-235416.8|共8页
作者
K. L. Rostov; S. Polzin; S. K. Saha; O. Brovko; V. Stepanyuk; W. Widdra;
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作者单位

Institute of Physics, Martin-Luther-Universitaet Halle-Wittenberg, 06120 Halle, Germany,Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, 1113 Sofia, Bulgaria;

Institute of Physics, Martin-Luther-Universitaet Halle-Wittenberg, 06120 Halle, Germany;

Max Planck Institute of Microstructure Physics, 06120 Halle, Germany;

Max Planck Institute of Microstructure Physics, 06120 Halle, Germany;

Max Planck Institute of Microstructure Physics, 06120 Halle, Germany;

Institute of Physics, Martin-Luther-Universitaet Halle-Wittenberg, 06120 Halle, Germany,Max Planck Institute of Microstructure Physics, 06120 Halle, Germany;

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正文语种 eng
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surface and interface dynamics and vibrations; oxide surfaces; electron scattering from surfaces;

机译：表面和界面的动力学和振动;氧化物表面电子从表面散射;

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专利

1. Fuchs-Kliewer HREEL Phonon Spectrum of Single Crystal NiO(100) and of Ni(100)/NiO(111) and Ni(100)/NiO(100) Thin Films [J] . G. A. Carson, M. H. Nassir, K. W. Wulser, Surface science spectra . 1998,第3期

机译：单晶NiO（100）以及Ni（100）/ NiO（111）和Ni（100）/ NiO（100）薄膜的Fuchs-Kliewer HREEL声子谱
2. Fuchs-Kliewer HREEL Phonon Spectrum of Single Crystal NiO(100) and of Ni(100)/NiO(111) and Ni(100)/NiO(100) Thin Films [J] . G. A. Carson, M. H. Nassir, K. W. Wulser, Surface science spectra . 1998,第3期

机译：单晶NiO（100）以及Ni（100）/ NiO（111）和Ni（100）/ NiO（100）薄膜的Fuchs-Kliewer HREEL声子谱
3. Adsorption of transition metal atoms on the NiO(100) surface and on NiO/Ag(100) thin films [J] . Fabrizio Cinquini, Livia Giordano, Gianfranco Pacchioni Theoretical chemistry accounts . 2008,第4a6期

机译：NiO（100）表面和NiO / Ag（100）薄膜上过渡金属原子的吸附
4. GROWTH AND CHARACTERIZATION OF LITHIUM NIOBATE THIN FILMS ON DIAMOND/Si(100) SUBSTRATES [C] . Shunxi Wang, Qingxin Su, Marc A. Robert, Symposium on ferroelectric thin films . 1999

机译：铌酸锂薄膜在金刚石/ Si（100）基体上的生长和表征
5. A study of the stability of ultra thin films of rhodium deposited on silver(100), gold deposited on copper(100), and gold deposited on silicon(100). [D] . Yang, Gimo. 1994

机译：研究了银（100）上沉积的铑，铜（100）上沉积的金和硅（100）上沉积的金的超薄膜的稳定性。
6. Semipolar r-plane ZnO films on Si(100) substrates: Thin film epitaxy and optical properties [O] . Ravi Aggarwal, Honghui Zhou, Chunming Jin, -1

机译：Si（100）衬底上的半极性r平面ZnO薄膜：薄膜外延和光学性质
7. Highly (100)-oriented Eu-doped PZT thin films on sol-gel derived (100)-textured LaNiO3/Si substrates [O] . Yu YJ, Wang FP, Chan HLW, 2004

机译：溶胶-凝胶衍生的（100）纹理的LaNiO3 / Si衬底上的高度（100）取向的Eu掺杂PZT薄膜
8. Geometric structures of thin film: Pt on Pd(110) and NiO on Ni(100). [R] . Warren, O. L. 1993

机译：薄膜的几何结构：pd（110）上的pt和Ni（100）上的NiO。

Surface-phonon dispersion of a NiO(100) thin film

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