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首页> 外文期刊>Physical review >Anomalous grain growth in the surface region of a nanocrystalline CeO_2 film under low-temperature heavy ion irradiation
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Anomalous grain growth in the surface region of a nanocrystalline CeO_2 film under low-temperature heavy ion irradiation

机译:低温重离子辐照下纳米CeO_2薄膜表面区域晶粒的异常生长

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摘要

Grain growth and phase stability of nanocrystalline ceria are investigated under ion irradiation at different temperatures. Irradiations at temperatures of 300 and 400 K result in uniform grain growth throughout the film. Anomalous grain growth is observed in thin films of nanocrystalline ceria under 3-MeV Au~+ irradiation at 160 K. At this low temperature, significant grain growth is observed within 100 nm from the surface, and no obvious growth is detected in the rest of the films. While the grain growth is attributed to a defect-stimulated mechanism at room temperature and above, a defect diffusion-limited mechanism is significant at low temperatures with the primary defect responsible being the oxygen vacancy. The nanocrystalline grains remain in the cubic phase regardless of defect kinetics.
机译:研究了不同温度下离子辐照下纳米晶二氧化铈的晶粒长大和相稳定性。在300和400 K的温度下进行辐照会导致整个薄膜的晶粒均匀生长。在3-MeV Au〜+辐照下,在160 K下,纳米晶氧化铈薄膜中观察到异常晶粒生长。在此低温下,在距表面100 nm处观察到明显的晶粒生长,而在其余部分中未检测到明显的晶粒生长。电影。虽然晶粒的生长归因于室温及更高温度下的缺陷刺激机制,但缺陷扩散受限机制在低温下非常重要,主要缺陷是氧空位。无论缺陷动力学如何,纳米晶粒都保留在立方相中。

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  • 来源
    《Physical review》 |2012年第21期|p.214113.1-214113.5|共5页
  • 作者单位

    Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, United Kingdom,Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA;

    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA,Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA;

    CEA-DEN, Service de Recherches de Metallurgie Physique, Centre d'Etudes de Saclay, 91191 Gif-sur-Yvette Cedex, France;

    Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA;

    University of Nebraska Medical Center, Omaha, Nebraska 68198, USA;

    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA,Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    physical radiation effects, radiation damage (for photochemical reactions, photochemistry); nanocrystalline materials; defects and impurities in crystals; microstructure;

    机译:物理辐射效应;辐射损伤(用于光化学反应;光化学);纳米晶体材料;晶体中的缺陷和杂质;微观结构;

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