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Reconfiguration and dissociation of bonded hydrogen in silicon by energetic ions

机译:高能离子对硅中键合氢的重构和离解

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摘要

We report in situ infrared measurements of ion-induced reconfiguration and dissociation of bonded hydrogen associated with various defects in silicon at low temperatures. Defect-associated Si-H complexes were prepared by low-temperature proton implantation in silicon followed by room-temperature annealing. As a result of subsequent low-temperature ~3He ion irradiation, we observed (1) ion-induced dissociation of Si-H complexes, (2) a notable difference in the dissociation rate of interstitial- and vacancy-type defects, and, unexpectedly, (3) the growth of bond-centered hydrogen, which is generally observed in association with low-temperature proton implantation. These findings provide insight into the mechanisms responsible for the dissociation of hydrogen bonds in silicon and thus have important implications for bond-selective nanoscale engineering and the long-term reliability of state-of-the-art silicon semiconductor and photovoltaic devices.
机译:我们报告原位红外测量的离子诱导的重构和键合氢的解离与低温下硅中的各种缺陷有关。通过在硅中低温质子注入,然后进行室温退火来制备与缺陷相关的Si-H配合物。随后的低温〜3He离子辐照的结果,我们观察到(1)离子诱导的Si-H络合物的解离,(2)间隙型和空位型缺陷的解离速率有显着差异,并且出乎意料的是,(3)以键为中心的氢的生长,通常与低温质子注入有关。这些发现提供了对导致硅中氢键解离的机理的深入了解,因此对键选择纳米级工程以及最新技术的硅半导体和光伏器件的长期可靠性具有重要意义。

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  • 来源
    《Physical review》 |2011年第4期|p.045204.1-045204.6|共6页
  • 作者单位

    Department of Physics, Pondicherry University, Puducherry 605014, India,Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA;

    Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, Tennessee 37235, USA,Vanderbilt Institute of Nanoscale Science and Engineering, Vanderbilt University, Tennessee TN 37235, USA;

    Department of Applied Science, College of William and Mary, Williamsburg, Virginia 23187, USA;

    Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA,Vanderbilt Institute of Nanoscale Science and Engineering, Vanderbilt University, Tennessee TN 37235, USA;

    Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA,Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, Tennessee 37235, USA,Vanderbilt Institute of Nanoscale Science and Engineering, Vanderbilt University, Tennessee TN 37235, USA,Institute for Advanced Materials Devices and Nanotechnology, Rutgers University, Piscataway, NJ 08901;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    semiconductors; metals, semimetals, and alloys; elemental semiconductors;

    机译:半导体;金属;半金属和合金;元素半导体;

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