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机译:碳表面扩散对SiC上外延石墨烯生长的作用
Sandia National Laboratories, Albuquerque, New Mexico 87185, USA Sandia National Laboratories, Livermore, California 94550, USA;
rnSandia National Laboratories, Albuquerque, New Mexico 87185, USA Sandia National Laboratories, Livermore, California 94550, USA;
rnSandia National Laboratories, Albuquerque, New Mexico 87185, USA Sandia National Laboratories, Livermore, California 94550, USA;
rnSandia National Laboratories, Albuquerque, New Mexico 87185, USA Sandia National Laboratories, Livermore, California 94550, USA;
rnSandia National Laboratories, Albuquerque, New Mexico 87185, USA Sandia National Laboratories, Livermore, California 94550, USA;
thin film structure and morphology; diffusion; interface formation; microscopy of surfaces, interfaces, and thin films;
机译:外延石墨烯生长的早期阶段,Si去除的3C-SiC(111)表面上碳原子的原子行为
机译:外延石墨烯生长的早期阶段,Si去除的3C-SiC(111)表面上碳原子的原子行为
机译:扩展缺陷SiC界面层对SiC外延石墨烯生长的作用
机译:碳蒸发在SiC上生长外延石墨烯及其表征
机译:化学气相沉积法在单晶铜表面上生长外延石墨烯
机译:SiC表面取向和Si损耗率对外延石墨烯的影响
机译:了解重建的6H-SiC(0001)表面上外延石墨烯的STM图像:尖端引起的石墨烯机械变形的作用