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Diamagnetic response of a superconducting surface superstructure: Si(111)-√7 × √3-In

机译:超导表面上层建筑的抗磁响应:Si(111)-7×1/3英寸

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摘要

Macroscopic superconductivity in various ultrathin films at the ultimate two-dimensional limit, i.e., films with thickness of only one- or two-atomic layers supported by single-crystal surfaces, has manifested itself in experiments with only zero resistance but not yet with the Meissner effect due to the lack of a proper in situ technique, although both phenomena are the defining characteristics of a superconductor. Using a self-developed multifunctional scanning tunneling microscope, we succeeded in detecting not only the macroscopic supercurrent but also diamagnetic response of a two-atomic-layer indium film on a Si(111) surface. The diamagnetic measurements reveal that the low-temperature variation of penetration depth follows the BardeenCooper-Schrieffer theory in the dirty limit. The magnitude of the pair-breaking interaction is determined to be 0.80 from the magnetic field dependence of the zero-temperature penetration depth, which implies that the pairing symmetry deviates slightly from an isotropic s wave. The present work demonstrates that it is possible to observe the Meissner effect in ultrathin superconducting films that are vulnerable to air, which is very helpful for a detailed understanding of the microscopic pairing mechanism.
机译:在极限二维极限的各种超薄膜中的宏观超导,即,具有单晶表面支撑的厚度的厚度的薄膜,在实验中表现出仅具有零阻力但尚未与Meissner的实验效果由于缺乏适当的原位技术,尽管这两种现象都是超导体的定义特征。使用自开发的多功能扫描隧穿显微镜,我们不仅在Si(111)表面上的两种原子层铟膜的宏观超电流而且还在宏观上进行检测。抗磁测量表明,渗透深度的低温变化在脏限制中遵循Bardeenooper-Schrieffer理论。根据零温度渗透深度的磁场依赖性确定配对相互作用的幅度为0.80,这意味着配对对称性偏离各向同性波略微偏离。本作者表明,可以观察易受空气的超超导膜中的萌效应,这对于对微观配对机构的详细了解非常有帮助。

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  • 来源
    《Physical review》 |2019年第14期|140506.1-140506.5|共5页
  • 作者单位

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China|Collaborat Innovat Ctr Adv Microstruct Nanjing 210093 Jiangsu Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China|Collaborat Innovat Ctr Adv Microstruct Nanjing 210093 Jiangsu Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China|Collaborat Innovat Ctr Adv Microstruct Nanjing 210093 Jiangsu Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China|Collaborat Innovat Ctr Adv Microstruct Nanjing 210093 Jiangsu Peoples R China;

    Shanghai Jiao Tong Univ Sch Phys & Astron Key Lab Artificial Struct & Quantum Control Minist Educ 800 Dongchuan Rd Shanghai 200240 Peoples R China|Shenyang Natl Lab Mat Sci Shenyang 110016 Liaoning Peoples R China|Collaborat Innovat Ctr Adv Microstruct Nanjing 210093 Jiangsu Peoples R China|Tsung Dao Lee Inst Shanghai 200240 Peoples R China;

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