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首页> 外文期刊>Plasma Science, IEEE Transactions on >Atmospheric-Pressure Diffuse Dielectric-Barrier-Discharge Plasma Generated by Bipolar Nanosecond Pulse in Nitrogen and Air
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Atmospheric-Pressure Diffuse Dielectric-Barrier-Discharge Plasma Generated by Bipolar Nanosecond Pulse in Nitrogen and Air

机译：氮和空气中双极纳秒脉冲产生的大气压弥散介质阻挡放电等离子体

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A bipolar high-voltage pulse with 20-ns rising time is employed to generate diffuse dielectric-barrier-discharge plasma with very low gas temperature in both nitrogen and air using a wire–plate electrode configuration at atmospheric pressure. Both the diffuse nanosecond pulsed discharge images and the optical emission spectra are recorded successfully. The gas temperatures of the nitrogen and air discharge plasmas are determined at 400 $pm$ 5 K and 320 $pm$ 5 K. The effects of discharge gap distance, pulse peak voltage, and pulse repetition rate on the emission intensities of $hbox{NO} (A^{2}Sigma rightarrow X^{2}Pi)$ , $hbox{OH} (A^{2}Sigma rightarrow X^{2}Pi, 0 - 0)$ , $hbox{N}_{2} (C^{3}Pi_{rm u} rightarrow B^{3}Pi_{rm g})$ , and $hbox{N}_{2}^{+}(B^{2}Sigma_{rm u}^{+} rightarrow X^{2} Sigma_{rm g}^{+}, 0 - 0, 391.4 hbox{nm})$ in both nitrogen and air are investigated, respectively. The effects of $hbox{O}_{2}$ and Ar on discharge images and the emission intensities in nitrogen are obtained. It is found that the emission intensities rise with increasing pulse peak voltage, pulse repetition rate, and the concentration of argon but decrease with increasing the discharge gap distance and the concentration of oxygen. The main physicochemical processes involved are discussed.
机译：利用大气压下的线板电极配置，使用上升时间为20 ns的双极高压脉冲来生成扩散的介质阻挡放电等离子体，该等离子体在氮气和空气中的气体温度都非常低。散射纳秒脉冲放电图像和光发射光谱均被成功记录。氮气和空气放电等离子体的气体温度确定为400 $ pm $ 5 K和320 $ pm $ 5K。放电间隙距离，脉冲峰值电压和脉冲重复频率对$ hbox发射强度的影响{ NO}（A ^ {2} Sigma rightarrow X ^ {2} Pi）$，$ hbox {OH}（A ^ {2} Sigma rightarrow X ^ {2} Pi，0-0）$，$ hbox {N} _ {2}（C ^ {3} Pi_ {rm u}右箭头B ^ {3} Pi_ {rm g}）$和$ hbox {N} _ {2} ^ {+}（B ^ {2} Sigma_分别研究了氮气和空气中的{rm u} ^ {+}右箭头X ^ {2} Sigma_ {rm g} ^ {+}，0-0、391.4 hbox {nm}）$。获得$ hbox {O} _ {2} $和Ar对放电图像和氮中发射强度的影响。已经发现，发射强度随着脉冲峰值电压，脉冲重复频率和氩气浓度的增加而增加，但是随着放电间隙距离和氧气浓度的增加而减小。讨论了涉及的主要物理化学过程。

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