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首页> 外文期刊>Plasma Science & Technology >Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition
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Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

机译：等离子体增强化学气相沉积法表征前驱二茂铁沉积的薄膜

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摘要

In this paper, the characterization of thin films, deposited with the precursor ferrocene (FcH) by the plasma enhanced chemical vapour deposition (PECVD) technique, was investigated. The films were measured by Scanning Electronic Microscopy (SEM), Atomic Force Microscopy (AFM), Electron Spectroscopy for Chemical Analysis (ESCA), and Superconducting Quantum Interference Device (SQUID). It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks. The surface roughness is about 36 nm. From the results of ESCA, it can be inferred that the film mainly contains the compound FeOOH, and carbon is combined with oxygen in different forms under different supply-powers. The hysteresis loops indicate that the film is of soft magnetism.
机译：本文研究了通过等离子增强化学气相沉积（PECVD）技术沉积前驱体二茂铁（FcH）的薄膜的特性。通过扫描电子显微镜（SEM），原子力显微镜（AFM），化学分析用电子光谱法（ESCA）和超导量子干涉仪（SQUID）测量膜。观察到膜的层厚度均匀并且具有致密的形态而没有裂缝。表面粗糙度为约36nm。从ESCA的结果可以推断出，该膜主要包含化合物FeOOH，并且碳在不同的供给功率下以不同的形式与氧结合。磁滞回线表明薄膜具有软磁性。

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