Physical Vapor Deposition: The Technical Process With a Relatively Short Past & a Long, Exciting Future

Donald M. Mattox

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Physical Vapor Deposition: The Technical Process With a Relatively Short Past & a Long, Exciting Future

机译：物理气相沉积：具有相对较短的过去和较长的，令人兴奋的未来的技术过程

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When it comes to physical vapor deposition processes, Don Mattox is P&SF's resident expert. Normally, he serves readers monthly as the columnist for "SVC Topics," but he responded to giving an extended overview in this issue. As the technical director of the Society of Vacuum Coaters in Albuquerque, NM, Mattox is highly qualified to give special industry insight on where PVD has been—and where it's going.

机译：在物理气相沉积过程中，唐·马托克斯（Don Mattox）是P＆SF的常驻专家。通常，他每月都会以“ SVC主题”的专栏作家的身份为读者提供服务，但是他回应了对此问题的扩展概述。作为新墨西哥州阿尔伯克基市真空镀膜机协会的技术主管，Mattox具备很高的资格，可以就PVD的发展现状和发展趋势提供特殊的行业见解。

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《Plating & Surface Finishing》 |1996年第11期|p.32-35|共4页
作者
Donald M. Mattox;
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中图分类金属腐蚀与保护、金属表面处理;
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2. Chemical vapor deposition-physical vapor deposition aluminum plug process for dynamic random-access memory applications [J] . Lee WJ, Rha SK Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2004,第4期

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4. Deposition and characterization of ZnO, ZnO:Al thin films deposited by rf-sputtering for Cu(In,Ga)Se2 thin film solar cells processing by physical vapor deposition [C] . J.Sastré-Hernández, F.A.Zubieta-López, M.Tufi(n)o-Velázquez, The 22nd International photovoltaic science and engineering conference . 2012

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5. Process-structure-property relationships of micron thick gadolinium oxide films deposited by reactive electron beam-physical vapor deposition (EB-PVD) [D] . Grave, Daniel A. 2014

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8. Continuous Cable Processing by the Physical Vapor Deposition Technique [R] . Hale, G. J. 1983

机译：物理气相沉积技术连续电缆处理

Physical Vapor Deposition: The Technical Process With a Relatively Short Past & a Long, Exciting Future

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