Renormalized molecular dynamics simulation of crack initiation process in machining defectless monocrystal silicon

Toyoshiro Inamura; Nobuhiro Takezawa; Shiro Shamoto

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Renormalized molecular dynamics simulation of crack initiation process in machining defectless monocrystal silicon

机译：加工无缺陷单晶硅中裂纹萌生过程的重新归一化分子动力学模拟

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By using renormalized molecular dynamics (RMD) proposed by the authors, computer experiments of machining defectless monocrystal silicon of various size have been carried out to investigate crack initiation process. The results show that a defectless monocrystal silicon can be machined in ductile mode in any scale in an absolute vacuum but exhibits brittle-ductile transition depending on the scale of machining in normal atmosphere. The effect of atmosphere taken into account in this study is adsorption and invation of atmospheric molecules into micro- crevices created in both static and dynamic manners in a crystal during machining.

机译：通过使用作者提出的重归一化分子动力学（RMD），已进行了加工各种尺寸的无缺陷单晶硅的计算机实验，以研究裂纹萌生过程。结果表明，无缺陷的单晶硅可以在绝对真空下以任何尺度以延性模式进行加工，但是根据正常大气中的加工规模，其表现出脆性-延性转变。在这项研究中考虑到的大气的影响是在加工过程中大气分子被吸附和侵入到晶体中以静态和动态方式产生的微缝隙中。

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来源
《精密工学会誌》 |1997年第1期|p.86-90|共5页
作者
Toyoshiro Inamura; Nobuhiro Takezawa; Shiro Shamoto;
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原文格式 PDF
正文语种 jpn
中图分类机械制造工艺;仪器、仪表;
关键词
molecular dynamics; crack initiation; brittle-ductile transition;

机译：分子动力学裂纹萌生脆性-韧性转变;

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Renormalized molecular dynamics simulation of crack initiation process in machining defectless monocrystal silicon

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