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首页> 外文期刊>Proceedings of the Arkansas Academy of Science >Spectroscopic Temperature Measurements for a Direct Current Arcjet Diamond Chemical Vapor Deposition Reactor
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Spectroscopic Temperature Measurements for a Direct Current Arcjet Diamond Chemical Vapor Deposition Reactor

机译：直流Arcjet金刚石化学气相沉积反应器的光谱温度测量

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摘要

The diamond thin film commercial market is projected to exceed one billion dollars by the year 2000. Potential applications of diamond thin films range from cutting tools to electronics to medical devices. The explosion of interest in this field results from the extreme properties diamond possesses: it is the hardest material known to man and yet, has a coefficient of friction similar to Teflon; its ability to conduct heat is five times that of copper; and diamond is completely inert. However, despite the tremendous economic incentive, there are still several technological barriers preventing diamond film scale-up to commercial production. Included among these are a fundamental understanding of the gas phase chemistry leading to diamond film formation and the lack of a reliable in situ, on-line Chemical Vapor Deposition (CVD) monitoring capability. Here we describe the use of optical emission spectroscopy (OES) as a possible direct current CVD plasma jet on-line monitor. Specifically, OES spectra from the C_2 radical, an intermediate species in the diamond CVD process, is utilized to obtain plasma gas temperatures in situ. Additionally, the reliability of a plasma gas temperature determined from OES is examined with Laser-Induced-Fluorescence (LIF).
机译：金刚石薄膜的商业市场预计到2000年将超过10亿美元。金刚石薄膜的潜在应用范围从切割工具到电子产品再到医疗设备。该领域引起人们关注的爆炸是钻石所具有的极端性能的：钻石是人类已知的最坚硬的材料，但其摩擦系数与特氟隆相似；它的导热能力是铜的五倍；钻石是完全惰性的。然而，尽管有巨大的经济动机，仍然存在一些技术障碍，无法将金刚石膜扩大到商业生产。其中包括对导致金刚石膜形成的气相化学原理的基本了解，以及缺乏可靠的原位在线化学气相沉积（CVD）监测功能。在这里，我们描述了使用光学发射光谱（OES）作为可能的直流CVD等离子喷射在线监测器。具体而言，利用来自C_2自由基的OES光谱（金刚石CVD工艺中的中间物种）来原位获得等离子体气体温度。另外，使用激光诱导荧光（LIF）检查了由OES确定的等离子气体温度的可靠性。

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