Indentation fracture behavior of (Mo_(0.85)Nb_(0.15))Si_2 crystals with C40 single-phase and MoSi_2(C11_b)/NbSi_2(C40) duplex-phase with oriented lamellae

Koji Hagihara; Shigehito Maeda; Takayoshi Nakano; Yukichi Umakoshi

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Indentation fracture behavior of (Mo_(0.85)Nb_(0.15))Si_2 crystals with C40 single-phase and MoSi_2(C11_b)/NbSi_2(C40) duplex-phase with oriented lamellae

机译：C40单相（Mo_（0.85）Nb_（0.15））Si_2晶体和取向片状MoSi_2（C11_b）/ NbSi_2（C40）双相的压痕断裂行为

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摘要

Fracture behavior and toughness of C40-structured (Mo_(0.85)Nb_(0.15))Si_2 single crystals and MoSi_2(C11_b)/NbSi_2(C40) duplex-phase crystals with oriented lamellae were investigated by micro-Vickers hardness tests. The indentation fracture toughness in the C40 single-phase showed low values of about 1.0-1.4 MPa m~(1/2), while fracture toughness was improved in the duplex-phase crystals. Ductile phase toughening by the C11_b phase, deflection of crack-propagation at the lamellar boundary and the effect of residual stress field at the crack tip are considered to be responsible for the increment of fracture toughness of MoSi_2(C11_b)/NbSi_2(C40) duplex-phase crystals.

机译：通过显微维氏硬度试验研究了C40结构的（Mo_（0.85）Nb_（0.15））Si_2单晶和取向片状MoSi_2（C11_b）/ NbSi_2（C40）双相晶体的断裂行为和韧性。 C40单相的压痕断裂韧性显示出较低的值，约为1.0-1.4 MPa m〜（1/2），而双相晶体的断裂韧性得到改善。认为C11_b相的韧性相韧化，层状边界处的裂纹扩展挠度以及裂纹尖端处的残余应力场的影响是MoSi_2（C11_b）/ NbSi_2（C40）双相钢断裂韧性增加的原因。相晶体。

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来源
《Science and Technology of Advanced Materials》 |2004年第2期|p.11-17|共7页
作者
Koji Hagihara; Shigehito Maeda; Takayoshi Nakano; Yukichi Umakoshi;
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作者单位

Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita, Osaka 565-0871, Japan;

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正文语种 eng
中图分类工程材料学;
关键词
mechanical property; silicide; fracture toughness; micro-vickers hardness test;

机译：力学性能;硅化物;断裂韧性;显微维氏硬度试验;

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1. Indentation fracture behavior of (Mo0.85Nb0.15)Si2 crystals with C40 single-phase and MoSi2(C11b)/NbSi2(C40) duplex-phase with oriented lamellae [J] . Science and technology of advanced materials . 2004,第1a2期

机译：C40单相和取向片状MoSi2（C11b）/ NbSi2（C40）双相的（Mo0.85Nb0.15）Si2晶体的压痕断裂行为
2. High-Temperature Deformation Behavior of (Mo_(0.85)Nb_(0.15))Si_2 Crystals with C40/C11_b Lamellar Microstructure [J] . Koji Hagihara, Haruka Araki, Takaaki Ikenishi, Materials science forum . 2017,第PTa1期

机译：具有C40 / C11_b层状微结构的（Mo_（0.85）Nb_（0.15））Si_2晶体的高温变形行为
3. Growth Kinetics of C11_b Lamellae in (Mo_(0.85), Nb_(0.15))Si_2 Intermetallics [J] . H. YANG, W. LI, A. SHAN Scripta materialia . 2005,第6期

机译：（Mo_（0.85），Nb_（0.15））Si_2金属间化合物中C11_b薄片的生长动力学
4. Growth of crystals and formation of C40/C11_b lamellar structure in (Mo_(0.85)Nb_(0.15))Si_2 [C] . Lanting Zhang, Ou Zhu, Yan Jiang, International conference on processing manufacturing of advanced materials;THERMEC 2009 . 2010

机译：（Mo_（0.85）Nb_（0.15））Si_2中晶体的生长和C40 / C11_b层状结构的形成

Indentation fracture behavior of (Mo_(0.85)Nb_(0.15))Si_2 crystals with C40 single-phase and MoSi_2(C11_b)/NbSi_2(C40) duplex-phase with oriented lamellae

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