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首页> 外文期刊>IEEE sensors journal >Room-Temperature Hydrogen Sensitivity of a MIS-Structure Based on the$hboxPt/LaF_3$Interface
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Room-Temperature Hydrogen Sensitivity of a MIS-Structure Based on the$hboxPt/LaF_3$Interface

机译:基于$ hboxPt / LaF_3 $ Interface的MIS结构的室温氢敏感性

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摘要

An$hboxLaF_3$layer was shown to improve the characteristics of field-effect gas sensors for room-temperature hydrogen monitoring. The$hboxPt/LaF_3$interface leads to a Nernst-type response and a detection limit of 10-ppm hydrogen in atmospheric air. The response time was shown to be about 110 s and was independent of hydrogen concentration. A method for the stabilization of a long-term behavior of the sensor was successfully demonstrated. The mechanism of the sensor's response to hydrogen was shown to be different from that of the metal/insulator/semiconductor (MIS)-type sensors.
机译:展示了一个hboxLaF_3 $层可以改善用于室温氢气监测的场效应气体传感器的特性。 $ hboxPt / LaF_3 $界面导致能斯特型响应和大气中氢的检出限为10 ppm。响应时间显示为约110 s,与氢浓度无关。成功证明了一种稳定传感器长期性能的方法。结果表明,传感器对氢的响应机制与金属/绝缘体/半导体(MIS)型传感器不同。

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