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首页> 外文期刊>IEEE sensors journal >Surface and in depth chemistry of polycrystalline WO3 thin films studied by X-ray and soft X-ray photoemission spectroscopies
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Surface and in depth chemistry of polycrystalline WO3 thin films studied by X-ray and soft X-ray photoemission spectroscopies

机译：X射线和软X射线光发射光谱研究多晶WO3薄膜的表面和深度化学

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摘要

The chemical composition of surface and underneath layers of WO3 thin films, deposited by thermal evaporation and annealed in air at different temperatures, has been studied by means of soft X-ray and X-ray photoemission spectroscopies. Both the W 4f and valence band spectra have been analyzed. The analysis has been performed on samples as inserted and after an annealing process in an ultra high vacuum. The results have shown that the surface always presents a nonstoichiometric WO3 compound, whose spectral components do not depend on the sample preparation. Instead, the study of the underneath layers has shown that the WO3 films annealed in air at 500°C are highly stoichiometric and stable, while the samples heated in air at 300°C are much more sensitive to the vacuum thermal treatment showing the presence of reduced WOx phases, whose intensity and chemical states change after the in vacuum annealing procedure.
机译：通过软X射线和X射线光发射光谱学研究了通过热蒸发沉积并在空气中退火的WO3薄膜表面和下层的化学组成。已分析了W 4f和价带谱。分析是对插入的样品以及经过超高真空退火处理后的样品进行的。结果表明，表面始终呈现非化学计量的WO3化合物，其光谱成分不取决于样品制备。相反，对下层的研究表明，在500°C的空气中退火的WO3薄膜具有高度化学计量和稳定性，而在300°C的空气中加热的样品对真空热处理更为敏感，表明存在还原的WOx相，其强度和化学状态在真空退火程序后发生变化。

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