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An approach for fabricating high-performance inductors onlow-resistivity substrates

机译:在低电阻率基板上制造高性能电感器的方法

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Porous Si layers up to 250 Μm in thickness are used to isolatenspiral inductors from low resistivity substrates. Wafer curvature andnsecondary ion mass spectroscopy (SIMS) analysis are done to address thenmanufacturability issue of porous Si. Spiral inductors with a singlenlevel Al on 2 in, p-type substrates of 0.008 Ω-cm resistivity arendemonstrated with Q<6 at 3 GHz for an L of ~8 nH. Large inductorsnwith L~100 nH have been shown with the first resonance frequency at 1nGHz. The expected performance potential as well as factors that could benlimiting the Q are discussed
机译:厚度高达250微米的多孔硅层用于将螺线管电感器与低电阻率的基板隔离。为了解决多孔硅的可制造性问题,进行了晶片曲率和二次离子质谱(SIMS)分析。在3 GHz下Q <6的情况下,在2英寸p型衬底上的电阻率为0.008Ω-cm的p型衬底上具有单能级Al的螺旋电感器,L约为8 nH。 L〜100 nH的大型电感器n的第一谐振频率为1 nGHz。讨论了预期的性能潜力以及可能限制Q的因素

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