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Analysis of temperature dependent hysteresis in MoS_2 field effect transistors for high frequency applications

机译:MoS_2场效应晶体管中高频应用的温度相关磁滞分析

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摘要

Thermal and hysteresis effects are studied for the first time in Al_22O_3 top-gated, CVD grown monolayer MoS_2 field effect transistors (FETs). Stressing with an applied bias reversed the hysteresis rotation in the high temperature I_(ds)-V_(gs) transfer characteristics and this behavior, indicative of a multilevel trap model, was explained by charge carriers interacting with traps possibly at the MoS_2/dielectric interface and within the CVD grown MoS_2. High temperature FET characteristics measured up to 125 ℃ demonstrated pinch-off degradation and the influence of trapping/detrapping rates in both the top and bottom gate dielectric. This indicates the importance of maintaining oxide and interface quality for good FET performance.
机译:在Al_22O_3顶栅,CVD生长的单层MoS_2场效应晶体管(FET)中首次研究了热效应和磁滞效应。施加偏压时的应力逆转了高温I_(ds)-V_(gs)传递特性中的磁滞旋转,这种行为(表示多能级陷阱模型)通过电荷载流子可能与MoS_2 /介电界面处的陷阱相互作用来解释并在CVD中生长的MoS_2。在高达125℃的温度下测得的FET高温特性显示出夹断性能下降,并且在顶部和底部栅极电介质中的俘获/去俘获速率均受到影响。这表明了保持氧化物和界面质量对于获得良好FET性能的重要性。

著录项

  • 来源
    《Solid-State Electronics》 |2014年第1期|87-90|共4页
  • 作者单位

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

    U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, Adelphi, MD 20783, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Transistor; MoS_2; Hysteresis;

    机译:晶体管;MoS_2;磁滞现象;

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